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Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass

a technology of tin oxide coating and flat glass, which is applied in the direction of coating, chemical vapor deposition coating, coating process, etc., to achieve the effect of improving the mechanical strength of the container

Inactive Publication Date: 2006-10-12
PILKINGTON GROUP LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0020] In accordance with the present invention, there is provided a chemical vapour deposition process for laying down a tin oxide or titanium oxide coating on a hot glass substrate using a precursor gas mixture containing the corresponding metal tetrachloride and an organic source of oxygen, without the requirement for inclusion of water vapour and the consequent risk of premature reaction.
[0029] The present invention involves the preparation of a precursor gas mixture which includes tin or titanium tetrachloride and an organic oxygen containing compound; a carrier gas or diluent, for example, nitrogen, air or helium, will normally also be included in the gas mixture. Since thermal decomposition of the organic oxygen containing compound may initiate the metal oxide deposition reaction at a high rate, it is desirable that the precursor mixture be kept at a temperature below the thermal decomposition temperature of the organic oxygen compound to prevent prereaction of the gaseous mixture with formation of the metal oxide.
[0034] The method of the invention permits the production, at high rates, of titanium oxide and tin oxide coatings on hot flat glass substrates on line during the glass production process. The titanium oxide coatings may be produced with a high refractive index (at least 2.4) permitting the achievement of desired optical effects, especially when used in combination with other coating layers. The tin oxide coatings may be doped, for example with fluorine, increasing their electrical conductivity and infra red reflectivity, and hence their utility as electrical conducting coatings and / or low emissivity coatings in architectural glazing and other applications.

Problems solved by technology

Unfortunately, tin tetrachloride reacts readily with water so that previous proposals to use tin tetrachloride and water vapour in gaseous form have usually involved supplying the gases separately to the glass surface and mixing them while in contact with the glass.

Method used

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  • Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
  • Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
  • Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass

Examples

Experimental program
Comparison scheme
Effect test

examples 1 to 5

[0054] In this series of Examples, a bi-directional coating reactor of the type shown in FIG. 3 was employed in the laboratory to deposit a titanium oxide coating.

[0055] In Examples 1, 2 and 3, the glass was heated on a conveyor furnace to simulate the coating reaction conditions of a float glass process in order to test the method of the present invention. The furnace utilized in-line rollers to convey a glass substrate through a heating zone prior to practicing the method of the present invention. In Example 1, the glass substrate was float glass which had been initially provided with a silica coating. The silica coating was deposited on the float glass through a known chemical vapour deposition process utilizing a precursor of monosilane in an oxygen enriched atmosphere. The silica deposition forms no part of the present invention.

[0056] In accordance with the present invention, a titanium oxide coating was deposited on the silica coated substrate. The substrate was at a temper...

example 6

[0064] A float glass process was used in producing a continuous glass ribbon having a thickness of 0.125 inches / 3 mm at a line speed of 434 inches / 11 metres per minute. The glass temperature was at 1140° F. / 615° C. at the desired point of application in the float bath section of a titanium oxide coating using a coating reactor similar to that shown in FIG. 3. The temperature at the precursor tower was 400° F. / 205° C. and the temperature at the reactor face was 500° F. / 260° C. Prior to practicing the method of the present invention, a silica coating was deposited on the glass substrate in the float bath section at a thickness of about 339 Å. The same chemical vapor deposition process as described in Example 1 was used to deposit the silica coating. The silica deposition forms no part of the present invention.

[0065] The precursor gas mixture was developed comprising titanium tetrachloride and ethyl acetate in a helium carrier gas. Oxygen was not used in the precursor as result of ear...

example 7

[0067] The same procedure carried out Example 6 was utilized in this Example. The substrate comprised coatings of silicon and then silica over the glass substrate. The coatings were deposited by a known chemical vapor deposition process in the float bath section. The silicon coating was deposited by CVD from monosilane with a non-oxidizing carrier gas. The silica coating was then deposited onto the silicon coating through the use of the same procedure as described in Example 1.

[0068] The precursor for the titanium oxide coating included titanium tetrachloride and ethyl acetate in a helium carrier gas. The volume percent composition of the precursor was 0.5% titanium tetrachloride, 1.9% ethyl acetate, and 97.6% helium. The corresponding flow rates for the components were 480.0 l / m of helium, 2.4 l / m of titanium tetrachloride, 9.2 l / m of ethyl acetate. The total flow rate for the precursor mixture was 491.6 1 / m.

[0069] The resulting coated article 52 is illustrated in FIG. 2. The gla...

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Abstract

A chemical vapor deposition process for laying down a tin or titanium oxide coating on a glass substrate through the use of an organic oxygen-containing compound and the corresponding metal tetrachloride. The organic oxygen compound is preferably an ester having an alkyl group with a β hydrogen in order to obtain a high deposition rate. The resulting article has a tin or titanium oxide coating which can be of substantial thickness because of the high deposition rates attainable with the novel process, and, in the case of titanium oxide coating possesses a desirable refractive index greater than 2.4. The coating growth rates resulting from the method of the present invention may be at least 130 Å per second.

Description

RELATED APPLICATION [0001] This application is a continuation of application Ser. No. 08 / 696,203 filed Aug. 13, 1996, which is hereby incorporated by reference. This application is claiming the benefit under 35 U.S.C. §120 of said application Ser. No. 08 / 696,203 filed under 35 U.S.C. §111.BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] This invention relates to a process for depositing titanium oxide and tin oxide coatings on a flat glass substrate, and the resulting coated glass. More particularly, this invention relates to a chemical vapour deposition process for producing titanium oxide and tin oxide coatings on flat glass using a coating precursor gas mixture comprising the corresponding metal tetrachloride and an organic oxidant. [0004] 2. Summary of Related Art [0005] Titanium oxide and tin oxide coatings have been proposed for use on glass containers, for example bottles, to improve the mechanical strength of the containers. It has also been proposed to us...

Claims

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Application Information

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IPC IPC(8): C23C16/00C03C17/245C23C16/40
CPCC03C17/2453C03C17/2456C23C16/405C03C2217/212C03C2218/152C03C2217/211
Inventor MCCURDY, RICHARD J.
Owner PILKINGTON GROUP LTD
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