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A photoresist developer

A developing solution and photoresist technology, applied in the field of developing solution, can solve the problem that the developing solution cannot take into account the developing properties, defoaming properties, and dispersion stability of the developing solution at the same time, and achieve excellent comprehensive performance, improved dispersion stability, and developability. and good dispersion stability

Inactive Publication Date: 2007-05-16
深圳市合力泰光电有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The present invention aims to overcome the defect that the developing solution in the prior art cannot simultaneously take into account developability, defoaming property, and dispersion stability or needs to add a defoaming agent to improve the defoaming property of the developing solution, and provides a solution that can be used in use. Developer composition that simultaneously improves developability, defoaming property, and dispersion stability

Method used

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  • A photoresist developer
  • A photoresist developer
  • A photoresist developer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] This example is used to illustrate the preparation of the developer solution of the present invention.

[0039] 0.6 parts by weight of 2-[polyethylene oxide-3,5-diphenethyl phenyl ether] ethane (ethylene oxide 9 mole adduct) and 0.5 parts by weight of KOH were added to 98.9 parts by weight Parts of water, at room temperature, under stirring conditions to prepare the developer solution S1.

Embodiment 2

[0041] This example is used to illustrate the preparation of the developer solution of the present invention.

[0042] The basic steps are the same as those in Example 1, except that the components and contents of the developer are different, and thus the developer S2 is prepared, as shown in Table 1.

Embodiment 3～16

[0044] Developers S3-S16 of Examples 3-16 in Table 1 can be prepared by using Gemini-type surfactants P1-P4 and different components and contents respectively.

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Abstract

This invention relates to one light resistance image development liquid, which comprises Gemini surface active agent, alkalinity compound and solvent agent, wherein, the surface active agent has the following structure and the R1,R2,R3,R4,R5,R'1,R'2,R'3,R'4,R'5 separately are selected from hydrogen, alkyl, aryl, aralkyl radical, halide; R6 for 2 to 6 methano and n for 6 to 23 integral numbers.

Description

technical field [0001] The invention relates to a developing solution, in particular to an alkaline aqueous photoresist developing solution used for image formation after photoresist exposure. Background technique [0002] Photoresists are widely used in the formation of wiring patterns for integrated circuits, printed circuit boards, color liquid crystal devices, or color filters. In the formation process of the wiring pattern, the pigment dispersion, solvent, photosensitive resin and related additives are first mixed to prepare a photoresist, and then the photoresist is coated on the substrate and pre-baked, and then exposed with a photomask , and then wash off the photoresist on the unexposed part with a developing solution, and then the photoresist film with the desired pattern can be obtained. Coating methods include dyeing method, printing method, electrodeposition method and pigment dispersion method, and common development methods include dipping development, shakin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/32
Inventor 金启明陈学刚董俊卿宫清何志奇
Owner 深圳市合力泰光电有限公司
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