Silver alloy, sputtering target material thereof, and thin film thereof

A silver alloy and thin film technology, applied in metal material coating process, sputtering coating, vacuum evaporation coating and other directions, can solve the problem of color liquid crystal display brightness reduction, insufficient improvement of sulfidation resistance, and reduced reflectivity, etc. problems, to achieve the effect of improved weather resistance, excellent heat resistance, and excellent vulcanization resistance

Active Publication Date: 2006-11-01
FURUYA KINZOKU KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, if the reflective electrode film containing the Ag-Pd-Cu-based silver alloy is subjected to the above-mentioned heating process, the growth of surface roughness and the occurrence of protrusions will occur to some extent as described in the comparative example described later, resulting in a decrease in reflectance.
Also, vulcanization is accelerated by heating, and sufficient improvement in vulcanization resistance is not obtained
With the sulfidation of the Ag-Pd-Cu-based silver alloy, the reflective electrode film turns yellow, which reduces the brightness of the color liquid crystal display

Method used

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  • Silver alloy, sputtering target material thereof, and thin film thereof
  • Silver alloy, sputtering target material thereof, and thin film thereof
  • Silver alloy, sputtering target material thereof, and thin film thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0055] Make 98.7Ag-0.8Pd-0.3Cu-0.2Ge (referring to Ag content: 98.7wt%, Pd content: 0.8wt%, Cu content: 0.3wt%, Ge content: 0.2wt%) with the method shown in embodiment .The following notation is used to indicate the composition of the silver alloy.) The silver alloy sputtering target material. Using this silver alloy sputtering target material, a silver alloy reflective film having the above composition was formed by sputtering on a quartz glass substrate with a smooth surface, as Example 1. The film thickness was 200 nm. The AFM (atomic force microscope, Atomic Force Microscope, manufactured by SII Corporation, model SPA300HV) image of the formed thin film is as follows Figure 4 (a) shown. At this time, surface roughness analysis was carried out, and Ra (nm) was 1.410, RMS (nm) was 1.785, and P-V (nm) was 14.07. Further, the reflectance of the silver alloy thin film of Example 1 was measured with a spectrophotometer (manufactured by Shimadzu Corporation, model UV-3100PC)....

Embodiment 2

[0057] The silver alloy thin film of Example 1 was heat-treated in air at 250° C. for 1 hour. Take this as Example 2. For the silver alloy film of Example 2, AFM observation is also carried out in the same manner as in Example 1, and the AFM image is shown in Figure 6 (a). At this time, surface roughness analysis was carried out, and Ra (nm) was 1.693, RMS (nm) was 2.203, and P-V (nm) was 24.55. Furthermore, the reflectance of the silver alloy thin film of Example 2 was measured similarly to Example 1. The results are shown in Figure 7 middle.

Embodiment 3

[0075] A silver alloy sputtering target material of 98.4Ag-0.8Pd-0.3Cu-0.5Ge was produced by the method shown in the embodiment. Using this silver alloy sputtering target material, a silver alloy reflective film of the above composition was formed on a quartz glass substrate with a smooth surface by sputtering. The film thickness was 200 nm. The silver alloy thin film was heat-treated at 250° C. for 1 hour in air. Take this as Example 3. Also carry out AFM observation to the silver alloy thin film of embodiment 3 in the same manner as embodiment 1, and the AFM image is shown in Figure 8 (a). At this time, surface roughness analysis was carried out, and Ra (nm) was 1.727, RMS (nm) was 2.314, and P-V (nm) was 28.06. Furthermore, the reflectance of the silver alloy thin film of Example 3 was measured similarly to Example 1. The results are shown in Figure 9 middle.

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Abstract

An Ag-Pd-Cu-Ge silver alloy is disclosed which enables to form a reflective electrode film which has such two characteristics at the same time that decrease in the reflectance due to thermal deterioration is extremely small and yellowing due to sulfuration hardly occurs even after the heating step during production of color liquid crystal displays. The silver alloy is characterized by having a chemical composition composed of at least 4 elements wherein Ag is mainly contained, and 0.10-2.89 wt% of Pd, 0.10-2.89 wt% of Cu and 0.01-1.50 wt% of Ge are also contained such that the total content of Pd, Cu and Ge is 0.21-3.00 wt%.

Description

technical field [0001] The present invention relates to a silver alloy excellent in heat resistance and sulfide resistance, a sputtering target material composed of the silver alloy, the silver alloy thin film, and a silver alloy paste. Furthermore, the silver alloy thin film is suitable for applications such as reflective films, reflective electrode films, electrode films, and wirings of displays such as liquid crystal displays and electronic components such as LEDs (light emitting diodes). Further, the silver alloy thin film is also suitable for reflective films and thin semi-permeable films of optical disk media, or reflective films of lighting components such as headlights and projection lamps of projectors, and can be used as an electromagnetic wave shielding protective film. Background technique [0002] In the manufacture of a color liquid crystal display, since it is heated to about 250° C. in a heating process performed in assembling a color filter or the like, the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C22C5/06C23C14/34
Inventor 渡边笃
Owner FURUYA KINZOKU KK
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