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Preparation method of patterned titanium dioxide micro structure

A technology of titanium dioxide and microstructure, applied in the direction of titanium dioxide, replication/marking methods, titanium oxide/hydroxide, etc., can solve the problems of low selectivity of self-assembled membranes, reduce experimental costs, etc., and achieve improved clarity and boundary resolution High efficiency, easy mass production, simple operation

Inactive Publication Date: 2006-06-14
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0004] After considering the above-mentioned problems, we adopted microcontact printing as the basic means of pattern preparation, and used titanium dioxide as the "ink" to omit the step of forming a patterned self-assembled monomolecular film with long-chain alkyl groups, which not only reduced the experimental cost and solves the problem of low selectivity of self-assembled membranes in nanoparticle deposition

Method used

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  • Preparation method of patterned titanium dioxide micro structure
  • Preparation method of patterned titanium dioxide micro structure
  • Preparation method of patterned titanium dioxide micro structure

Examples

Experimental program
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Effect test

Embodiment 1

[0016] Fabrication of patterned titania microstructures on ordinary glass slides:

[0017] 1. Pretreatment of slides

[0018] Ordinary glass slides were cut into appropriate sizes and heat-treated with a mixed solution of concentrated sulfuric acid and hydrogen peroxide (Piranha solution) at 90°C for one hour.

[0019] 2. Preparation of Patterned Elastic Stamps

[0020] Polydimethylsiloxane (Sylgard 184 Dow Corning Company) was poured on the patterned surface of the micro-processed single crystal silicon membrane plate, cured at 150° C. for one hour, and aged and peeled off to obtain a silicone rubber elastic stamp with micropatterns.

[0021] 3. Preparation of titania sol

[0022] Butyl titanate [Ti(OBu) 4 ] as the raw material, accurately measure a certain amount of butyl titanate and dissolve it in absolute ethanol, the volume is two-thirds of the required volume, and add acetylacetone (AcAc) as an inhibitor. Then, under vigorous stirring, a mixed solution of nitric aci...

Embodiment 2

[0029] Fabrication of patterned titania microstructures on single crystal silicon wafers:

[0030] 1. Pretreatment of monocrystalline silicon wafers

[0031] Cut the monocrystalline silicon wafers into appropriate sizes and heat-treat them with a mixed solution of concentrated sulfuric acid and hydrogen peroxide (Piranha solution) at 100°C for one and a half hours.

[0032] 2. Preparation of Patterned Elastic Stamps

[0033] Polydimethylsiloxane (Sylgard 184 Dow Corning Company) was poured on the patterned surface of the micro-processed single crystal silicon membrane plate, cured at 150° C. for one hour, and aged and peeled off to obtain a silicone rubber elastic stamp with micropatterns.

[0034] 3. Preparation of titania sol

[0035] Butyl titanate [Ti(OBu) 4 ] as the raw material, accurately measure a certain amount of butyl titanate and dissolve it in absolute ethanol, the volume is two-thirds of the required volume, and add acetylacetone (AcAc) as an inhibitor. Then,...

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Abstract

A process for preparing the patterned TiO2 microstructure includes such steps as photoetching on the surface of monosilicon to form a pattern, using it as template, filling polydimethylsiloxane on its surface, ageing, stripping to obtain an elastic seal, using TiO2 sol as í‹inkíŒ, microcontact printing on substrate by embossing to obtain the TiO2 film with patterned microstructure.

Description

technical field [0001] The invention relates to a method for preparing a patterned titanium dioxide microstructure on a planar substrate. Background technique [0002] Titanium dioxide thin films have high application value in microelectronic devices, optical cells, and solar energy conversion because of their high catalytic properties, self-cleaning properties, and microbial degradation. Based on this, the preparation of patterned titanium dioxide thin films has become a research hotspot in recent years. However, there are great limitations in the assembly and preparation of patterned titanium dioxide microstructures: mainly in the problems of high preparation cost, unstable reaction system, and low selectivity of titanium dioxide particles in deposition (Chem.Mater.2002, 14 : 1236. Langmuir 2003, 19: 4415. Thin Solid Films 2001382: 153). Contents of the invention [0003] The object of the present invention is to provide a method for preparing a patterned titanium diox...

Claims

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Application Information

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IPC IPC(8): B41M5/00C01G23/047
Inventor 陈淼张瑞
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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