Nanometer film shaping machine

Abstract

The invention discloses a nano film forming machine for preparing nano functional film, which comprises a vacuum tank body and a generator, the vacuum tank body comprising a cabin and a top cover which is equipped with the cabin, the generator being equipped with the inner of the cabin and being fixed by a supporting flange which is equipped with the cabin, the rotation shaft of the generator being provided with a base-tray, the top cover being equipped with a liquid inlet which locates above the base-tray, the vacuum tank body being equipped with a vacuum adapter for evacuation, in the vacuum tank body being provided with a heat source for thermal dissociation and a light source for photo dissociation, and the heat source and light source equipped upper than base-tray; the invention has a merit of: taking film formation, thermal dissociation or photo dissociation and phase-change in high temperature in a whole body, and guaranteeing the film quality.

Description

technical field [0001] The invention relates to a device for preparing nanometer functional films, in particular to a nanometer film forming machine. Background technique [0002] Nano-functional thin films are one of the hotspots in the frontier field of material research, and nano-functional thin films are widely used in high-tech fields, especially in the field of military technology. At present, most nano-films are deposited by CVD (chemical vapor deposition), PCVD (physical chemical vapor deposition), MOCVD (metal organic chemical vapor deposition), pulsed laser deposition (PLD), magnetron sputtering, sol-gel (Sol-Gel) ) method and other methods. The productivity of the first five methods is very low, the equipment used is expensive, and the production cost is high. Therefore, the high-speed nano film forming machine has broad application prospects. The sol-gel method has high productivity and needs to be combined with the spin-coating process, which is carried out o...

AI Technical Summary

Problems solved by technology

However, sol (gel) film products have high activity, and are prone to chemical reactions in contact with air during transportation, and are also subject to dust pollution, which affects product quality.

In addition, the maximum speed of the general-purpose glue homogenizer is about 5000rpm, and it is difficult to prepare films with a thickness below 100nm. Increasing the speed (about 10,000rpm) can prepare films of tens or tens of nanometers, but special vibration reduction measures are required (general-purpose glue homogenizers) The machine generally does not have the function of vibration reduction)

Otherwise, the high-speed rotating base plate is prone to vibration, which will affect the quality of product forming

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