Breeding method of drought-resistant polyploid linear stonecrop herb
A cultivation method, the technology of S. japonica, applied in horticultural methods, botanical equipment and methods, seed and rhizome treatment, etc., can solve the problems of weak growth potential, limited growth amount, and failure to meet requirements, etc.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0006] Embodiment 1: the cultivation technique of the high drought-resistant S. argentina of the present invention is realized by taking the following steps:
[0007] 1. Screen out plants with good stress resistance and strong growth potential from wild S. japonica, and collect the seeds of the plants. After artificial cultivation, further screen the seeds of the target plants;
[0008] 2. Use 2×10 16 N + / cm 2 -9×10 16 N + / cm 2 Nitrogen ion beams are used to irradiate the screened S. japonica seeds, induce mutations, and produce practical species with special traits such as high drought resistance and strong growth potential. After artificial cultivation, the S. japonica seeds are screened;
[0009] 3. Utilize 1‰ of colchicine solution to soak the beneficial S. japonica seeds screened out, and induce polyploidy to make it polyploidy, so that the biological yield of S. sagerassica on the unit area and unit time have increased significantly;
[0010] 4. Use tissue cultu...
Embodiment 2
[0011] Embodiment 2, the ion beam of the present invention can also use inert ion beams such as neon ion beams and helium ion beams. All the other are with embodiment 1.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com