Sputtering apparatus

A sputtering device and sputtering technology, applied in the field of functional thin films and functional thin films, can solve problems such as easy peeling and poor film strength

Inactive Publication Date: 2004-09-15
ULVAC INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0011] However, the titanium oxide thin film 113 formed by the sol-gel method has the disadvantage of being easy to peel off due to poor film strength.

Method used

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Embodiment Construction

[0050] Preferred embodiments of the invention are described below

[0051] The functional thin film and functional substrate of the present invention will be described in detail, and the method for producing the titanium oxide thin film of the present invention will also be described.

[0052] refer to image 3 , Reference numeral 9 is an example of a film forming apparatus for forming the functional thin film of the present invention. This film forming apparatus 9 has a vacuum chamber 54 . A turntable 59 is arranged on the bottom side in the vacuum chamber 54 , and a delivery unit 60 and the first to third film forming units 51 to 53 are arranged on the upper top thereof.

[0053] The turntable 59 can be rotated horizontally, and can also be moved up and down, and the substrate to be filmed can be sent into and out of the feeding part 60 from the delivery and delivery port not shown in the figure, and placed on the turntable 59, when the turntable is rotated At 59 o'clock,...

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Abstract

To obtain a titanium oxide thin film having high durability and photocatalytic function. Titanium oxide thin films 31 are made to exist at intervals on the surface of a barrier thin film 12, hydrophilic thin films 41 are formed between the titanium thin films to constitute a functional thin film 3. Since both parts to which the titanium oxide thin films 31 are exposed and parts to which the hydrophilic thin films 41 are exposed exist together on the surface of the functional thin film 31, functions of both the thin films can be obtained. Consequently a self cleaning effect and superhydrophilic nature are developed under an environment of irradiation with ultraviolet rays and a hydrophilicity of a certain degree is obtained even at a dark place. When a titanium oxide target in the titanium oxide thin films 31 is sputtered with a sputtering gas containing an oxygen gas, deficient oxygen in the titanium oxide thin film to be formed can be supplied with oxygen to form the titanium oxide thin films 31 having a photocatalytic function.

Description

[0001] The application for the present invention is a divisional application of the patent application whose application number is CN00101041.7 (application date is January 11, 2000). technical field [0002] The invention relates to the technical field of functional thin films, in particular to the technical field of application of functional thin films with photocatalytic function. Background technique [0003] In recent years, titanium oxide (TiO 2 ) are of great interest. [0004] It is well known that titanium oxide is a kind of photocatalyst, which can be activated when it is irradiated by ultraviolet rays, so that oxygen in the air can generate hydroxyl radicals and superoxide anions. Cleaning effect, in addition, due to the decomposition of pollutants, a clean surface is exposed, and as a result, superhydrophilicity can be obtained. [0005] Figure 8 The middle symbol 110 is a mirror to which the above-mentioned titanium oxide is applied. The mirror 110 has a sub...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/34B01DB01D53/86B01JB01J35/02C03CC23CC23C14/08C23C14/34
Inventor 根岸敏夫平岩秀行牧元贵彦
Owner ULVAC INC
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