Etching agent composition and method for producing reflective plate using the same etching liquid composition

Abstract

The etchant composition for etching a metallic reflective multilayer film comprising two or more layers containing a metallic reflective film and a SiO2film simultaneously with one solution, comprises phosphoric acid, nitric acid, acetic acid, hydrofluoric acid and water each blended.

Description

technical field [0001] The present invention relates to an etchant composition for a laminated film including a metal reflective film used in a reflector of a liquid crystal display device and a method for producing a reflector using the etchant composition. Background technique [0002] As a liquid crystal display device, a reflective liquid crystal display device that utilizes external light has attracted attention for portable use in places where external light such as sunlight or indoor lighting is bright due to its low power consumption. This reflective liquid crystal display device can provide users with a clear display by using the reflector provided in the liquid crystal display device even without using a backlight when the external light is bright. Provides a crisp display using front or back lighting. When a reflective liquid crystal display device uses a backlight, the reflective plate must have translucent reflective properties, so it is necessary to partially ...

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Problems solved by technology

[0004] In addition, on the reflective mirror layer of the reflective liquid crystal display device, in order to increase the reflectivity of the metal reflective film and improve the wavelength characteristics of reflected light, layers with different refractive indices (a layer with a high refractive index and a layer with a low refractive index) are laminated on the metal reflective layer. layer) light-transmitting layer, however, laminated with SiO 2 layer containing SiO 2 Laminated film, such as SiO with a refractive index of about 1.7 from the upper layer 2 Film, high refractive index film ITO (indium tin oxide) film with a refractive index higher than 2.0, SiO 2 It is difficult to etch the laminated film of film, silver alloy, and ITO film at the same time with a single solution when using a conventional etching solution, and it is difficult to form a highly detailed pattern

That is, SiO 2 The film uses hydrofluoric acid etching solution, the ITO film uses organic acid and inorganic acid etching solution, silver and silver alloy use inorganic acid etching solution (aluminum etching solution, etc.), each film needs to be etched separately, so the etching process is very complicated. It is loaded down with trivial details and also not economical (referring to JP 2001-192752, JP 63-184726, JP 52-108351, JP 2001-77098)

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