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Coating template calibrating device and method for sputtering nano multilayer film

A nano-multilayer, template technology, applied in sputtering, coating, metal material coating process, etc., can solve the problem of small color and gloss contrast, unclear boundary of positioning graphic film, increase template processing cost and difficulty, etc. problems, to reduce the processing cost and difficulty, improve the integrity rate and performance, and achieve the effect of a reliable preparation method

Inactive Publication Date: 2004-04-07
TIANJIN UNIVERSITY OF TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The problems existing in the existing registration method are: 1. During the registration operation process of replacing the template, the template is very easy to scratch the sputtered nano-film, which makes the preparation rate low and even leads to performance failure; 2. The graphic film used for positioning on the chip is also a nano-scale film, which has a small color and gloss contrast with the substrate, and the boundary of the positioning graphic film is unclear and difficult to identify with the naked eye, which will lead to inaccurate positioning; 3. Since the resolution of the naked eye is only 200 microns , so the alignment accuracy of the existing registration method is not high for the preparation of multi-layer films that require precise positional relationships between the graphic films of each layer; 4. After the template is aligned, the template and the substrate are clamped on the sample holder During the operation process, it is very easy to produce relative sliding between the template and the substrate, which will cause deviations in registration; 5. The template not only needs to process the graphics of the film layer, but also needs to process the graphics of the positioning, which increases the cost and difficulty of template processing

Method used

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  • Coating template calibrating device and method for sputtering nano multilayer film
  • Coating template calibrating device and method for sputtering nano multilayer film
  • Coating template calibrating device and method for sputtering nano multilayer film

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Embodiment

[0014] Embodiment: a kind of registration device (see figure 1 -a, figure 1 -b, figure 2 ), is characterized in that it is made of sample holder 9, spring clip 8, template 2, substrate 6, registration frame 1, substrate and copper clip 5 of registration frame and jacking bolt 7, said The registration frame 1 is placed on the sample holder 9 and fixed by the spring clip 8. The registration frame 1 is a frame with a certain width cut along the periphery of the template blank, and the cut part with the sputtering pattern is the template 2 , the registration frame 1 and the substrate 6 are placed in the copper clip 5, and are fixed by the tightening bolts 7, the template 2 with the sputtering pattern 3 is placed in the registration frame 1, and the template with the sputtering pattern 3 There is a gap 4 between 2 and the registration frame 1.

[0015] The materials of the template 2 and the registration frame 1 in the registration device mentioned above should be tough, easy t...

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Abstract

The present invention is coating template calibrating device and method for sputtering nano multilayer film. The device consists of sample holder, spring clamp, template, substrate, calibrating frame, and their fixing parts. The metod includes setting the template inside the calibrating frame, and regulating the interval between the template and the calibrating frame to ensure the calibrating precision. The present invention is superior to available technology in that it has no relative sliding between the temperature and the substrate, less work load, lower cost and difficulty, raised quality and performance of the nano multilayer film.

Description

(1) Technical field: [0001] The invention relates to a manufacturing device and method of nanometer materials, in particular to a device and method for registering templates of various film layers of sputtering nanometer multilayer films. (two) background technology: [0002] Nano-multilayer film generally refers to the film material formed by alternate deposition of two or more different materials on the substrate material with a certain nano-scale thickness. Because of its unusual physical and mechanical properties, broad application prospects and huge potential economic benefits, it has become a research hotspot in the world. At present, the methods for preparing nano-multilayer films mainly include physical vapor deposition (PVD) and chemical vapor deposition (CVD), and magnetron sputtering is one of the PVD methods. Due to certain requirements for nano-multilayer films (such as: device manufacturing, performance testing, etc.), each layer of film needs to be sputtered ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C14/34
Inventor 由臣赵燕平陈民芳孙永昌刘技文王志奇
Owner TIANJIN UNIVERSITY OF TECHNOLOGY
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