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Substrate treating device

A substrate processing device and substrate technology, applied in lighting and heating equipment, cleaning methods and utensils, drying, etc., can solve problems such as island-shaped residual liquid that is easy to generate

Inactive Publication Date: 2003-11-12
SUMITOMO PRECISION PROD CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] In particular, in recent years, substrates have been increased in size, and there is a problem that island-like residual liquid tends to be generated on such large substrates.

Method used

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Embodiment Construction

[0026] The present invention will be described in more detail below with reference to the accompanying drawings.

[0027] As shown in FIG. 1 , the substrate processing apparatus of the present invention includes: a transport mechanism 1 that horizontally transports a substrate W in the direction of an arrow 10; a wet processing unit WET that performs a wet process on a substrate W transported by the transport mechanism 1; The dry processing part DRY of dry processing; and the membrane liquid supply mechanism 4, the first upper air knife (air knife) 6, the first lower air knife 7, The second upper air knife 8, the second lower air knife 9.

[0028] Also, the above-mentioned wet processing part WET, membrane liquid supply mechanism 4, the first upper air knife 6, the first lower air knife 7, the second upper air knife 8, the second lower air knife 9 and the dry processing part DRY are storage In the cover body that is made of 2 sidewalls 15,15, base plate 17, upper plate 17. I...

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Abstract

A substrate treating device capable of applying wet and dry treatments to a substrate in order while transferring the substrate by a transfer means, comprising a transfer mechanism (1) for transferring the substrate (W), a wet treatment part (WET) for applying the wet treatment to the transferred substrate (W), a membrane liquid feeding mechanism (4) disposed on the downstream side of the wet treatment part (WET) in transfer direction and feeding treatment liquid formed in membrane shape onto the substrate (W), and a gas jetting mechanism (6) having a slit-shaped opening part, disposed on the downstream side of the membrane liquid feeding mechanism (4) in transfer direction so that the opening part can face the substrate (W) through the entire width thereof, and causing a platy draft by jetting gas from the opening part.

Description

technical field [0001] The present invention relates to a substrate processing apparatus that sequentially performs wet and dry processing on a substrate while being conveyed by a conveying mechanism, and particularly relates to a substrate processing apparatus having excellent drying uniformity of the substrate. Background technique [0002] At present, in the process of manufacturing glass substrates such as liquid crystal displays and photomasks, or substrates such as printed circuit boards and semiconductor wafers, various treatment liquids are supplied to the surface of the substrate, and the surface of the substrate is treated with the treatment liquid. , the process of removing it from the substrate surface. [0003] For example, in the cleaning process of the substrate, use a cleaning device to clean the surface of the substrate with a processing liquid such as pure water, and then blow a drying gas on the surface of the substrate in a drying device to remove the pro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/02B08B5/02F26B5/14F26B15/12H01L21/00
CPCH01L21/67057H01L21/67034F26B15/12B08B3/022F26B5/14B08B5/023H01L21/304
Inventor 水川茂中田胜利松元俊二
Owner SUMITOMO PRECISION PROD CO LTD
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