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Substrate, stage device, method of driving stage, exposure system and exposure method

A technology of exposure device and driving method, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, optics, etc., to achieve the effects of avoiding swing, eliminating vibration, and shortening adjustment time

Inactive Publication Date: 2002-10-09
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, even in the case of adopting this technology, if the stage is increased in size and speed, the influence of the above-mentioned reaction force cannot be completely eliminated.

Method used

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  • Substrate, stage device, method of driving stage, exposure system and exposure method
  • Substrate, stage device, method of driving stage, exposure system and exposure method
  • Substrate, stage device, method of driving stage, exposure system and exposure method

Examples

Experimental program
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Effect test

no. 1 Embodiment

[0028] First, according to Figure 1 to Figure 5 The first embodiment will be described. figure 1 The shown exposure apparatus 1 is roughly configured as follows: a rectangular (or arc-shaped) illumination area on a regrind (mask) R is illuminated with uniform illuminance by exposure illumination light from a light source (not shown). Illumination optical system IU of the illumination optical system; comprise the original plate stage (stage body, the first object stage) 2 as the mask stage of holding original plate R and the original plate fixed disk (fixed disk) supporting this original plate stage 2 ) 3 stage device 4; projection optical system PL for projecting illumination light emitted from reticle R onto wafer (substrate) W; including wafer stage (stage Main body, first stage) 5 and stage device 7 holding wafer fixed plate (fixed plate) 6 of the wafer stage 5; and reaction frame supporting the above-mentioned stage device 4 and supporting projection optical system PL ...

no. 2 Embodiment

[0066] Figure 6 It is a figure which shows the 2nd Example of the stage apparatus and exposure apparatus of this invention. In this figure, with Figure 1 to Figure 5 The components that are the same as those of the first embodiment shown are assigned the same reference numerals, and description thereof will be omitted. The difference between the second embodiment and the above-mentioned first embodiment lies in the structure of the stage device 7, so it will be described below.

[0067] As shown in the figure, the stage device 7 is mainly composed of a wafer stage 5, a wafer holding plate 6, and a support frame (reaction stage) 46 supporting them from below. Furthermore, the stator 37 is configured to move in the Y direction with respect to the support frames 46 via the rotation rails 38 inserted between the support frames 46 . The wafer platen 6 is also vibrated independently of the support frames 46 by the anti-vibration unit 29 arranged between the support frames 46 . ...

no. 3 Embodiment

[0071] Figure 7 It is a figure which shows the 3rd Example of the stage apparatus and exposure apparatus of this invention. In this figure, with Figure 1 to Figure 5 The components that are the same as those of the first embodiment shown are assigned the same reference numerals, and description thereof will be omitted. The difference between the third embodiment and the above-mentioned first embodiment lies in the structure of the wafer stage 5, so it will be described below.

[0072] As shown in the figure, on both sides of the projection optical system PL in the Y direction, off-axis alignment sensors 49a, 49b are arranged at predetermined intervals, and the alignment sensors 49a, 49b are provided with two wafer stages 5 along the alignment direction. , 5. In each wafer stage 5, a magnet assembly (see figure) constituting a rotor of a movable linear motor is incorporated. Moreover, the linear guide rails 50 extending along the X direction of the stator of the wafer sta...

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Abstract

The object stage device (4) includes: a support part (8), which is vibrateably and independently arranged relative to the fixed plate (3); and a reaction force stage (17), which is The resulting reaction force is free to move on the support (8) in said one direction. Thereby, since problems such as shaking due to the reaction force can be avoided, the adjustment time can be shortened, productivity can be improved, and transmission of residual vibration of the support portion to the fixed plate can be suppressed.

Description

technical field [0001] The present invention relates to a stage device for moving a substrate of an exposure mask pattern such as a glass substrate or a wafer, and a stage body holding the substrate in a plane on a fixed plate, and a driving method thereof, and the use of the stage device Exposure device and exposure method for performing exposure treatment with a mask and substrate held in the center, especially when manufacturing devices such as semiconductor integrated circuits or liquid crystal displays, substrates, stage devices, and stage driving methods suitable for photolithography processes And an exposure device and an exposure method thereof. Background technique [0002] Conventionally, in the photolithography process, which is one of the manufacturing processes of semiconductor devices, a circuit pattern formed on a mask or original plate (hereinafter referred to as original plate) is copied onto a wafer or glass coated with a resist (photosensitive agent). Var...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70716G03F7/70766G03F7/709H01L21/027
Inventor 高桥正人
Owner NIKON CORP
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