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Method for producing grey mask

A technology of gray-tone mask and manufacturing method, which is applied in the photoengraving process of the pattern surface, the manufacture of semiconductor/solid-state devices, the original for opto-mechanical processing, etc. Calibrate offsets, reduce time, ensure quality results

Inactive Publication Date: 2006-11-08
HOYA CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, even with this method, although there is a difference in the degree of offset compared to the previous method, it cannot solve the problem of graphic offset

Method used

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  • Method for producing grey mask
  • Method for producing grey mask
  • Method for producing grey mask

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Embodiment Construction

[0038] Embodiments of the present invention will be described in detail below.

[0039] figure 1 It shows the first embodiment of the manufacturing method of the gray tone mask of this invention, and is a schematic cross-sectional view showing the manufacturing process in order of process.

[0040] The mask blank used in this embodiment is as figure 1 As shown in (a), a light semitransmissive film 22 and a light shielding film 23 are sequentially formed on a transparent substrate 21 such as quartz. Here, as the material of the light-shielding film 23, a thin film and a material capable of obtaining high light-shielding properties are preferable, and examples thereof include Cr, Si, W, Al, and the like. In addition, as the material of the semi-transmissive film 22, a thin film is preferred and a semi-transmissive material with a transmittance of about 50% can be obtained when the transmittance of the light-shielding portion is 0%. For example, Cr compounds (Cr oxides, nitr...

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PUM

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Abstract

Provided is a method for manufacturing a gray-tone mask of the intermediate color film type that can produce high-quality TFTs. The method has the following steps: preparing to sequentially form a semi-transmissive film (22) and a light-shielding film (23) on a transparent substrate (21) ) of a mask blank; a step of forming a resist film on the mask blank; using pattern data below the resolution limit of an exposure device set to perform pattern drawing and forming a light-transmitting portion and a light-shielding portion The graphic data synthesized from the graphic data is used to graphically draw the resist film, and the exposure amount is adjusted and exposed on the portion of the resist film forming the semi-transmissive portion; a development process is performed to form a light shielding layer. The process of creating a resist pattern (24a) with different resist residual film values ​​in the portion where the light-transmitting portion is formed and the portion where the semi-transparent portion is formed; using the resist pattern (24a) as a mask, the light-shielding film (23) and the semi-transmissive portion are etched. The process of forming a light-transmitting film (22) and forming a light-transmitting part; the process of removing only the resist pattern remaining on the semi-transmissive part; using the remaining resist pattern as a mask, etching the light-shielding film (23a) and forming a semi-transmissive part. Translucent part process.

Description

technical field [0001] The present invention relates to a method for manufacturing a graytone mask (graytonemask) suitable for manufacturing a thin film transistor liquid crystal display (Thin Film Transistor Liquid Crystal Display: hereinafter referred to as TFT-LCD). Background technique [0002] Compared with CRT (cathode ray tube), TFT-LCD has the advantages of easy thinning and low power consumption, so it is currently being commercialized rapidly. TFT-LCD has a TFT substrate with a structure in which TFTs are arranged in each pixel arranged in a matrix, and a color filter in which red, green, and blue pixel patterns are superimposed and arranged corresponding to each pixel through a liquid crystal phase. . In the TFT-LCD, the number of manufacturing steps is large, and it is necessary to use 5 to 6 photomasks even to manufacture the TFT substrate. [0003] Under such circumstances, a method of manufacturing a TFT substrate using four photomasks has been proposed (for...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/14G03F7/20H01L21/00G03F1/68G03F1/80H01L21/027
CPCG03F1/80G03F1/34G03F1/32G03F7/70283G03F7/70508G03F7/203
Inventor 井村和久
Owner HOYA CORP
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