Structure of double-bit mask type only-read memory and its making method

A read-only memory and manufacturing method technology, which is applied in semiconductor/solid-state device manufacturing, electric solid-state devices, semiconductor devices, etc., can solve the problems of memory cell interference, easy generation of second-bit effects, and small operating margins, avoiding the Mutual interference, elimination of second-order effects, and improved operating margins

Inactive Publication Date: 2006-05-17
MACRONIX INT CO LTD
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] However, since the buried drain junction of the known dual-bit mask mode ROM is connected to the dual-bit encoding region, junction leakage is very likely to occur, and the second bit is likely to occur. Effect (Second Bit Effect)
In addition, there is still a problem in the known double-bit mask mode ROM, that is, the memory cells in the memory element are easily interfered by other memory cells around.
And because the storage unit of the known double-bit mask mode read-only memory is easily disturbed by other storage units around and is prone to cause the second bit effect, the operating margin (OperationWindow) of the known memory element is relatively small

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  • Structure of double-bit mask type only-read memory and its making method
  • Structure of double-bit mask type only-read memory and its making method
  • Structure of double-bit mask type only-read memory and its making method

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Embodiment Construction

[0027] Figure 2A to Figure 2E , which is a cross-sectional schematic view of the manufacturing process of the dual-bit mask mode ROM according to a preferred embodiment of the present invention.

[0028] Please refer to Figure 2A Firstly, a gate structure 105 is formed on a substrate 100 . Wherein, the gate structure 105 includes a gate conductive layer 104 and a gate oxide layer 102 formed under the gate conductive layer 104 . In this embodiment, the material of the gate conductive layer 104 is, for example, polysilicon, and the thickness of the gate oxide layer 102 is, for example, about 45 angstroms.

[0029] Next, a pocket ion implantation step 106 is performed to form a pocket doped region 108 in the substrate 100 on both sides of the gate structure 105 . In this embodiment, the ions implanted in the pocket-type doped region 108 are, for example, arsenic ions, and an ion implantation dose in the pocket-type ion implantation step 106 is, for example, 1×10 13 / cm 2 A...

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Abstract

A double-bit mask mode read-only memory structure and its manufacturing method, the structure includes a substrate; a gate structure, arranged on a part of the substrate; a double-bit coding area, arranged under the two sides of the gate structure In the substrate; at least one spacer is arranged on both sides of the gate structure; a buried drain is arranged in the substrate on both sides of the spacer; a doped region is arranged on the buried drain and the double In the substrate between the bit-coded regions, the ion type of the doped region is opposite to that of the double-bit coded region, and the ion concentration of the doped region is higher than that of the double-bit coded region; an insulating layer, It is arranged above the buried drain; and a word line is arranged on the gate structures in the same row.

Description

technical field [0001] The present invention relates to a structure of a mask-mode read-only memory and a manufacturing method thereof, and in particular to a structure of a double-bit mask-mode read-only memory and a manufacturing method thereof. Background technique [0002] Mask ROM is the most basic type of ROM. It mainly adjusts its threshold voltage (Threshold Voltage) through an ion implantation process to achieve the purpose of controlling the memory cell to be turned on (On) or turned off (Off). When the product of the mask mode ROM is changed, the process does not need to be greatly modified, but only a set of photomasks used is changed, so it is very suitable for mass production, and even semi-finished products with part of the process can be made first. , When the order arrives at the factory, these semi-finished products can be quickly programmed (Programming), which can effectively shorten the delivery time. [0003] A dual bit mask mode ROM is currently unde...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/112H01L21/8246
Inventor 刘慕义范左鸿詹光阳叶彦宏卢道政
Owner MACRONIX INT CO LTD
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