Photoetching machine equipment with symmetrical double-roller structure

A double-drum, symmetrical technology, applied in the field of lithography machines, can solve the problems of low efficiency of lithography plate making, and achieve the effects of improving plate making efficiency, saving time, and convenient transportation

Pending Publication Date: 2022-07-29
湖南印之明智能制造有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The purpose of the present invention is to provide a lithography machine equipment with a symmetrical double-drum structure to solve the problem of low efficiency of the existing lithography plate making

Method used

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  • Photoetching machine equipment with symmetrical double-roller structure
  • Photoetching machine equipment with symmetrical double-roller structure
  • Photoetching machine equipment with symmetrical double-roller structure

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Experimental program
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Embodiment

[0024] figure 1 It is a schematic structural diagram of an embodiment of a lithography machine with a symmetrical double-drum structure of the present invention; figure 2 It is a side view of an embodiment of a lithography machine with a symmetrical double-drum structure of the present invention; image 3 It is a roller structure diagram of an embodiment of a lithography machine with a symmetrical double roller structure of the present invention; Figure 4 It is a schematic diagram of the platen structure of an embodiment of a lithography machine with a symmetrical double-drum structure of the present invention.

[0025] As shown in the figure, a lithography machine device with a symmetrical double-roller structure according to the present invention includes a base 1, and a mounting frame 2 is arranged on the base 1. The installation frame 2 is provided with a drum 3, the drum 3 is a vacuum adsorption drum, and the vacuum adsorption drum adopts the existing structure. The ...

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Abstract

The invention discloses photoetching machine equipment with a symmetrical double-roller structure, which comprises a base, a mounting rack arranged on the base, rollers arranged on the mounting rack, a fixed plate arranged on the mounting rack, a roller structure and a pressing plate structure arranged on the fixed plate, and a roller structure and a pressing plate structure arranged above the rollers, the top end of the fixing plate is connected with a plate conveying platform through a sliding structure, a conveying structure used for conveying plates is arranged on the plate conveying platform, and a scanning platform used for scanning the plates is arranged on the base. By adopting the photoetching machine equipment with the symmetrical double-roller structure, the problem that the existing photoetching plate-making efficiency is low can be solved.

Description

technical field [0001] The invention relates to the technical field of photolithography machines, in particular to a photolithography machine device with a symmetrical double-roller structure. Background technique [0002] The lithography machine is one of the main production equipment for semiconductor manufacturing, and it is also the core technology machine that determines the level of the entire semiconductor production process. Lithography machine, also known as: mask alignment exposure machine, exposure system, lithography system, etc., is the core equipment for manufacturing chips. It uses a technique similar to photo printing to print the fine patterns on the reticle onto the silicon wafer through the exposure of light. The lithography machine is generally divided into three types: manual, semi-automatic and fully automatic according to the simplicity of operation. Fully automatic means that the duration and cycle of exposure from the upper and lower plates of the s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20B65G15/20
CPCG03F7/70725G03F7/70733B65G15/20
Inventor 王泽明邓超略陈蓬柱
Owner 湖南印之明智能制造有限公司
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