Method for improving anti-stripping performance of high-temperature alloy oxidation film
A high-temperature alloy, oxide film technology, applied in anodizing, metal material coating process, coating and other directions, can solve the problem of unhindered oxide film crystals such as coarse columnar crystals, etc., to improve anti-stripping performance, wide adaptability, delay The effect of peeling time
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0021] The present invention will be described in detail below with reference to specific embodiments. The following examples will help those skilled in the art to further understand the present invention, but do not limit the present invention in any form. It should be noted that, for those skilled in the art, several modifications and improvements can be made without departing from the concept of the present invention. These all belong to the protection scope of the present invention.
[0022] An embodiment of the present invention provides a method for improving the peeling resistance of an oxide film of a superalloy. The method includes: forming a metal film on the surface of the superalloy after service; performing oxidation treatment on the metal film, and forming a porous oxide on the surface of the superalloy after service membrane, the structure of the porous oxide film is as figure 1 It can be seen that the porous oxide film formed on the surface of the superalloy ...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com