Aluminum profile surface etching device and method

Abstract

The invention relates to an aluminum profile surface etching device and method. Belongs to the technical field of etching equipment. In order to solve the problems that an aluminum profile cannot be subjected to clamping treatment before etching, etching liquid is wasted and etching is excessive, the following technical scheme is provided, the aluminum profile etching device comprises an etching box body, an etching liquid box, a liquid guide hose and an etching gun, a guide assembly is connected to the interior of the etching box body, a water pump is connected to the upper portion of the etching liquid box, and the liquid guide hose is connected to the lower portion of the etching liquid box. One end of the water pump is connected with one end of the liquid guide hose, a clamping mechanism is connected to the middle of the etching box body, driving motors are connected to the surfaces of the two sides of the etching box body, and the driving ends of the driving motors are connected with the clamping mechanism. By arranging the clamping and fixing mechanism and the driving motor, the aluminum profile can be better fixed before being etched, so that later etching is facilitated, in addition, after one face is etched, the aluminum profile can be turned over rapidly, and etching of the aluminum profile is more thorough.

Description

technical field [0001] The invention relates to the technical field of etching equipment, in particular to an aluminum profile surface etching device and method. Background technique [0002] At present, in the processing technology of the inner and outer circuit grooves of aluminum profiles, acidic and alkaline etching methods are used to make the grooves required for line discharge, and the production is completed in one etching. When the traditional direct immersion etching process is used, the surface conditions of aluminum profiles are different: for example, there are no holes on the surface, the size of the aperture on the surface is different, or the holes on the surface are distributed differently, and there are pools of different degrees on the surface of the etching potion. Effect, so the etching conditions of the upper surface and the lower surface are inconsistent, resulting in differences in the etched line width. With the emergence of etching devices, the cur...

AI Technical Summary

Problems solved by technology

When the traditional direct immersion etching process is used, the surface conditions of aluminum profiles are different: for example, there are no holes on the surface, the size of the aperture on the surface is different, or the holes on the surface are distributed differently, and there are pools of different degrees on the surface of the etching potion. effect, so the etching conditions on the upper surface and the lower surface are inconsistent, resulting in differences in the etched line width

With the emergence of etching devices, the current devices on the market still cannot perform a clamping process on the aluminum profile before etching, and each flip of the board needs to be manually operated, which makes the overall etching more cumbersome; The first is that it is difficult to collect the excess etching solution during etching, resulting in a certain waste of resources; the second is that after the etching is completed, it is difficult to perform a quick cleaning, which will cause the etching solution to over-etch the surface of the aluminum profile

Finally, the tediousness of the entire etching method leads to high technical requirements for operators.

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