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Generation method for improving waveband selectivity of DUV light source

A production method and selective technology, applied in the field of lithography machines, can solve problems such as difficulties in realization, and achieve the effects of improving design accuracy, facilitating disassembly, and ensuring safety performance

Pending Publication Date: 2022-03-18
AIR FORCE UNIV PLA
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  • Application Information

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Problems solved by technology

The traditional control of capillary DUV radiation is mainly realized by adjusting the gas composition and voltage waveform, but both methods require a lot of experimentation and trial and error, which is extremely difficult to achieve

Method used

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  • Generation method for improving waveband selectivity of DUV light source
  • Generation method for improving waveband selectivity of DUV light source
  • Generation method for improving waveband selectivity of DUV light source

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Embodiment Construction

[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0032] see figure 1 Shown, the present invention is a kind of generation method that promotes the band selectivity of DUV light source, comprises the following steps:

[0033] Step 1: Complete the assembly of the generating device for producing DUV. The generating device includes a quartz tube 1. The two ends of the quartz tube 1 are respectively provided with a high-voltage electrode 2 and a low-voltage electrode 3. The quartz tube 1 is connected with a vacuum ass...

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Abstract

The invention discloses a generation method for improving wave band selectivity of a DUV light source. The generation method comprises the following steps that 1, a generation device for producing a DUV is assembled; 2, the interior of the quartz tube is vacuumized through a vacuumizing assembly; step 3, filling gas into the quartz tube through an inflation assembly; step 4, turning on a high-voltage pulse power supply, and forming pulse voltage and a strong electric field on the high-voltage electrode; step 5, exciting gas molecules or atoms in the tube by a strong electric field to form a high-speed moving ionization wave and move towards a low-voltage end; 6, forming a plasma region containing a large number of excited-state molecular atoms and ions in the movement process of the ionization waves; 7, the excited-state molecules in the plasma area can form a large amount of optical radiation in the de-excitation process, and therefore a DUV light source is formed; according to the invention, the trial and error cost can be greatly reduced, and the waveband selectivity of the DUV light source is improved.

Description

technical field [0001] The invention relates to the technical field of photolithography machines, in particular to a method for improving the band selectivity of a DUV light source. Background technique [0002] Lithography machines, lasers, etc. all need to use deep ultraviolet (DUV) light sources, and a common deep ultraviolet light source generating device is a capillary discharger. The capillary discharger is mainly composed of a quartz capillary, electrodes that penetrate into both ends of the capillary, a high-voltage pulse power supply and a vacuum system. By pumping the capillary to mbar-level vacuum and applying a high-voltage pulse on the electrode, a nanosecond pulse fast ionization wave can be formed in the capillary. The ionization wave process will generate a large number of excited state components, which will be released during the de-excitation process. Radiation in different bands, including the DUV band. At present, the control of DUV radiation is mainly...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05G2/00G03F7/20
CPCH05G2/008H05G2/003G03F7/2004G03F7/70033
Inventor 朱益飞
Owner AIR FORCE UNIV PLA
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