Reflective TOF device for cluster beam comprehensive deposition
A reflective device and reflective technology, applied in the measurement device, sputtering coating, ion implantation coating and other directions, can solve the problem of inaccurate measurement and achieve the effect of accurate measurement
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Embodiment 1
[0030] refer to figure 1 , a reflective TOF device for cluster beam integrated deposition, including:
[0031] The cluster ion accelerating device 1 includes a first accelerating electrode and a second accelerating electrode, wherein the first accelerating electrode applies a pulsed high voltage to the cluster ions and serves as an initial signal A, so that the cluster ions are deflected to the first reflecting device and initially accelerated , wherein the second accelerating electrode accelerates the cluster ions by 2-5keV.
[0032] The first flight channel 2 communicates with the output end of the cluster ion accelerator 1 , and the accelerated cluster ions fly freely in the first flight channel 2 .
[0033] The first reflector 3 is located in the first flight channel 2 for reflecting cluster ions, the angle between the first reflector 3 and the axis of the first flight channel 2 is 10-90°, refer to figure 1 , in this embodiment the included angle is 20°.
[0034] The se...
Embodiment 2
[0037] refer to figure 2 , on the basis of Embodiment 1, an electrode modulator 11 is provided along the movement path of cluster ions in the first flight channel 2, and the electrode modulator 11 is used to modulate cluster ions to modulate selective ions and non-selective ions. A deflection electrode 12 is arranged parallel to the movement path of the cluster ions in the flight channel 2. The deflection electrode 12 is composed of a first electrode sheet and a second electrode sheet and generates a uniform electric field. The deflection electrode 12 separates the selected ions from the cluster The ions are offset and fly, and the non-selective ions continue to run along the original trajectory.
[0038] The first flight channel 2 is provided with a second reflection device 10, the second reflection device 10 is located at the selective ion movement path where the deflection electrode 12 is offset, and the angle between the second reflection device 10 and the axis of the fir...
Embodiment 3
[0042] refer to image 3 , On the basis of the second embodiment, the third flight channel 13 is provided with a telescopic channel 8, and the telescopic channel 8 is connected with an adjustment mechanism 9 that drives its telescopic movement. In this embodiment, the telescopic channel 8 adopts a metal bellows.
[0043] refer to Figure 4, the adjustment mechanism 9 is composed of a connecting ring 91, a screw rod 92, a polished rod 93, a stopper 94, a nut 95, a worm wheel 96, a bracket 97, a motor 98 and a worm screw 99, and the outsides of both ends of the telescopic channel 8 are fixedly connected with a connecting ring 91, One of the connecting rings 91 is fixedly connected with the polished rod 93 and the screw rod 92, and the other connecting ring 91 is slidably connected with the polished rod 93 and is fixedly connected with a bracket 97. The port of the polished rod 93 is welded with a stopper 94 to prevent the connecting ring 91 from coming out. 97 is provided with ...
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