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High-thermal-conductivity silicon carbide device packaging structure and method

A device packaging, high thermal conductivity technology, applied in the direction of semiconductor devices, semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, etc., can solve problems such as the stability of the unfavorable silicon carbide device structure, normal use, and increased heat generation. , to achieve good cooling effect and reduce conduction loss

Pending Publication Date: 2021-10-22
威星国际半导体深圳有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In view of the above situation, in order to overcome the defects of the prior art, the present invention provides a high thermal conductivity silicon carbide device packaging structure and method, which effectively solves the problem of the existing silicon carbide device packaging structure. With the increase of the power of silicon carbide devices , the amount of heat generated increases, which is not conducive to the stability of the structure of silicon carbide devices and the problems of normal use

Method used

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  • High-thermal-conductivity silicon carbide device packaging structure and method

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Embodiment 1

[0025] Embodiment one, by Figure 1-2 Provided, the present invention provides a high thermal conductivity silicon carbide device packaging structure and method, including a heat sink 1, an adhesive layer 2, a metal layer 3, an insulating substrate 4, a circuit layer 5 and a miniature thermocouple arm 6, the thermal The surface of the sink 1 is connected to the metal layer 3 through the bonding layer 2, the surface of the metal layer 3 is connected to the insulating substrate 4 through the bonding layer 2, the surface of the insulating substrate 4 is connected to the circuit layer 5 through the bonding layer 2, and the heat sink 1 A miniature thermocouple arm 6 is mounted on the bottom end of the bottom end by bolts.

[0026] The insulating substrate 4 is one or more of aluminum nitride ceramic materials, alumina ceramic materials or silicon carbide ceramic materials.

[0027] The bonding layer 2 adopts active metal brazing material.

[0028] A high thermal conductivity sili...

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Abstract

The invention discloses a high-thermal-conductivity silicon carbide device packaging structure and method, and solves the problem that the stability and normal use of a silicon carbide device structure are not facilitated due to the fact that the heat generation amount is increased along with the increase of the power of the silicon carbide device in an existing silicon carbide device packaging structure. The packaging structure comprises a heat sink, a bonding layer, a metal layer, an insulating substrate, a circuit layer and a miniature thermocouple arm. The surface of the heat sink is connected with the metal layer through the bonding layer, the surface of the metal layer is connected with the insulating substrate through the bonding layer, the surface of the insulating substrate is connected with the circuit layer through the bonding layer, and the miniature thermocouple arm is mounted at the bottom end of the heat sink through a bolt.

Description

technical field [0001] The invention relates to the field of silicon carbide device packaging, in particular to a high thermal conductivity silicon carbide device packaging structure and method. Background technique [0002] Silicon carbide power semiconductor devices usually include silicon chips, semiconductor circuits, circuit substrates and heat sinks. Silicon carbide semiconductor devices can operate stably at temperatures ranging from 250°C to 300°C, which can significantly increase the output of power devices. The circuit board has insulating properties and is composed of aluminum nitride, etc., which have high thermal conductivity. Heat sinks have higher thermal conductivity and ensure easier mass-manufactured heat dissipation devices, such as Cu, Al, Cu-Mo or Cu-W. The components are bonded together using adhesives, solder, and the like. The metal layer is located between the chip and the heat sink, and undertakes the dual functions of heat dissipation transition...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L23/38H01L21/50
CPCH01L23/38H01L21/50
Inventor 张昌利张涵金镇亨
Owner 威星国际半导体深圳有限公司
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