Signal fuzzy control filter for wafer detection device

Abstract

The invention relates to the technical field of filters, in particular to a signal fuzzy control filter for a wafer detection device. The signal fuzzy control filter comprises a wafer machine table, a detection module, a filter terminal and a controller. Due to the conditions of fragments and the like of the wafer in the circulation process, the operation of a machine table needs to be suspended for cleaning, and the application effect of the wafer detection device in production is influenced, so phase angle analysis is carried out on electric signal waveforms of wafer position information of the wafer detection device in different stations of a wafer machine table through the arranged phase circuit and clock circuit, and the position error of each wafer in the wafer machine table is converted into the relative position difference between the circulating wafers in each station; the signal fuzzy control filter for the wafer detection device has a fuzzy screening effect on the electric signal data transmitted by the wafer detection device, and reduces the processing capacity of a controller after the filter terminal processes the peak-valley value of the electric signal waveform through the analysis of the waveform phase angle, thereby improving the application effect of the signal fuzzy control filter for the wafer detection device.

Description

technical field [0001] The invention relates to the technical field of filters, in particular to a signal fuzzy control filter for a wafer detection device. Background technique [0002] Wafer quality is an important technical indicator of integrated circuits. Wafer surface defects and crystal defects need to be detected by corresponding inspection instruments, such as using a high-speed camera to capture patterns on the wafer and converting them into Taking the time of the detection record as the scalar, the pattern of the wafer is taken as the electrical signal wave of the physical unit variable, and the filter is used to filter to achieve the purpose of wafer quality inspection; the filter is a frequency selection device that can Let specific frequency components in the signal pass, while greatly attenuating other frequency components, and analyze the waveform to obtain the quality of the corresponding pattern wafer. With the development of the integrated circuit industry...

AI Technical Summary

Problems solved by technology

[0003] The current wafer detection device needs to screen the data signal of each wafer in the machine, and its peak processing speed limits the prospect of further optimization of the detection process. At the same time, in the process of signal processing using filters, the same Due to the influence of the environment in the workshop where the machine is installed, it will cause interference to the accuracy of waveform detection, which in turn will weaken the application effect of the wafer detection device in production

[0004] For example, a Chinese patent with the application number CN202010945635.4 discloses a signal fuzzy control filter for a wafer detection device, which relates to the field of semiconductor technology. The signal fuzzy control filter is connected in series to the detection sensor and processing of the wafer detection device The original sensor signal is obtained between the sensors, and the synchronous rack is bypassed to sample the time synchronization signal. The processed signal can be generated based on the original sensor signal and the time synchronization signal. The processed signal is output from the first effective signal edge of the original sensor signal. The first valid level of a single standard width, and then output the level synchronized with the original sensor signal until the second valid signal edge of the original sensor signal, output the second valid level of a single standard width again, and the processed signal is relatively Idealized and characteristic normalized filtering is performed on the original sensor signal. This technical solution can effectively filter out clutter and various abnormal noises in the original sensor signal, thereby effectively improving the detection performance of the wafer detection device; but This technical solution does not solve the problem that during the production process of the wafer in the machine, the difference in ambient temperature due to the different process parameters between the machine stations will interfere with the accuracy of the electrical signal transmission of the wafer detection device, and then weaken the filter. The problem of the performance of the device

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