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HMDS leakage-proof protection device for spin coating developer

A protection device and developing machine technology, applied in photography, opto-mechanical equipment, photo-engraving process of pattern surface, etc., can solve the problem of easy leakage of HMDS

Pending Publication Date: 2021-09-10
宁波润华全芯微电子设备有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The present invention aims at the above-mentioned defects existing in the prior art, and proposes an HMDS leak-proof protection device for a glue leveling developing machine, which solves the problems of easy leakage of HMDS and how to collect and process it

Method used

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  • HMDS leakage-proof protection device for spin coating developer
  • HMDS leakage-proof protection device for spin coating developer
  • HMDS leakage-proof protection device for spin coating developer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] like Figure 1-4 As shown, a kind of HMDS anti-leakage protection device for the glue-leveling developing machine of the present embodiment comprises:

[0051] HMDS tank 1, used to provide HMDS gas;

[0052] A sealed protective cover 2, the HMDS tank 1 is installed inside the sealed protective cover 2, and the inside of the sealed protective cover 2 is in a sealed state;

[0053] The nitrogen feeding mechanism 3 is arranged on the side of the sealing protective cover 2, and the output end of the nitrogen feeding mechanism 3 extends to the inside of the sealing protective cover 2 for providing nitrogen;

[0054] Also includes:

[0055] The frame is arranged on the side of the sealing protective cover 2;

[0056] Exhaust mechanism 4, is installed on the frame, and the exhaust end of exhaust mechanism 4 is arranged on the inside of sealing protective cover 2, and the exhaust end of exhaust mechanism 4 is arranged on the outside of sealing protective cover 2, is used for...

Embodiment 2

[0079] Compared with Embodiment 1, in this embodiment, in order to solve the technical problem of how to automatically recycle and collect HMDS, such as Figure 9 Shown:

[0080] Automatic recovery mechanism 6 comprises a second air pump 22, a second air pipe 23, a second air guide pipe 24 and a high-pressure collection tank 25, the second air pump 22 is installed on the frame, and one end of the second air pipe 23 is connected to the sealing protective cover The inner top of 2 is sealed and communicated, the other end of the second air extraction pipe 23 communicates with the air extraction end of the second air extraction pump 22, the high-pressure collection tank 25 is arranged on the side of the frame, and one end of the second air guide pipe 24 is connected to the second air extraction pump. The exhaust end of 22 communicates, and the other end of the second air guide pipe 24 is connected with the high-pressure collection tank 25 internally.

[0081]Specifically, when th...

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Abstract

The invention relates to the technical field of HMDS treatment equipment, and particularly relates to an HMDS leakage-proof protection device for a spin coating developer. The device comprises an HMDS tank, a sealing protection cover, a nitrogen feeding mechanism, a rack, an air exhaust mechanism mounted on the rack, an absorption mechanism, an automatic recovery mechanism, a controller, a leakage detection sensor and an alarm, wherein the air exhaust end of the air exhaust mechanism is arranged in the sealing protection cover; the absorption mechanism is arranged on the air exhaust mechanism; the automatic recovery mechanism is arranged on the rack, and the air exhaust end of the automatic recovery mechanism is in sealing connection with the top end of the inner side of the sealing protection cover; the controller is arranged on the outer side wall of the sealing protection cover; the leakage detection sensor is arranged on the inner side of the sealing protection cover, and the leakage detection sensor is electrically connected with the controller; and the alarm is installed on the outer side wall of the sealing protection cover and electrically connected with the leakage detection sensor and the controller. Safety accidents caused by HMDS leakage can be completely eradicated, if leakage occurs, an alarm signal is sent out, raw material supply is cut off, continuous leakage is avoided, and leaked HMDS is collected.

Description

technical field [0001] The invention relates to the technical field of HMDS processing equipment, in particular to an HMDS leak-proof protection device for a glue leveling developing machine. Background technique [0002] In the prior art, before coating the photoresist, people need to put the substrate into the HMDS pretreatment equipment for pretreatment. The purpose is to reduce the contact angle between the HMDS-treated silicon wafer and the photoresist, thereby reducing the The difficulty of spreading the photoresist on the surface of the silicon wafer during the photoresist improves the adhesion between the photoresist and the silicon wafer. The tackifier HMDS (hexamethyldisilazane) can improve this situation very well. After the HMDS is coated on the surface of the silicon wafer, it can be reacted to form a compound mainly composed of siloxane after being heated in an oven. It successfully changes the surface of the silicon wafer from hydrophilic to hydrophobic, and...

Claims

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Application Information

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IPC IPC(8): G03F7/30G03F7/16
CPCG03F7/3092G03F7/3064G03F7/16
Inventor 耿克涛刘金
Owner 宁波润华全芯微电子设备有限公司
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