High-speed photonic integrated chip based on surface plasmon enhancement and preparation method
A surface plasmon and photon integration technology, applied in the direction of electrical components, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problems of slow response and unadjustable bandwidth, so as to improve the corresponding speed and speed up the current carrying Sub compound rate, effect of improving responsiveness
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[0042] Embodiments of the present invention will be disclosed in the following diagrams. For the sake of clarity, many practical details will be described together in the following description. It should be understood, however, that these practical details should not be used to limit the invention. That is, in some embodiments of the invention, these practical details are not necessary.
[0043] Such as Figure 1-2 As shown, the present invention is a high-speed photonic integrated chip based on surface plasmon enhancement, with InGaN / GaN multi-quantum well LED epitaxial wafers as the carrier, including a silicon substrate layer 1, a buffer layer arranged on the silicon substrate layer 1 2. The non-doped GaN layer 3 disposed on the buffer layer 2, the n-type GaN layer 4 disposed on the non-doped GaN layer 3, the InGaN / GaN multiple quantum well layer 5 disposed on the n-type GaN layer 4, and the The p-type GaN layer 6 on the InGaN / GaN multi-quantum well layer 5; the LED devic...
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