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Hydrophobic membrane structure, detection method and detection system thereof, and wafer carrier

A technology for structural detection and hydrophobic membranes, which is applied in the direction of film/sheet adhesives, electrical components, and analysis through chemical reactions of materials, and can solve problems such as structural damage of hydrophobic membranes

Active Publication Date: 2021-08-20
CHANGXIN MEMORY TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the embodiment of the present invention is to provide a hydrophobic membrane structure and its detection method, detection system, and wafer carrier, so that when the hydrophobic membrane structure is broken, the hydrophobic The color of the membrane structure changes, so as to solve the problem that the hydrophobic membrane structure is damaged only when there is a problem with the product or equipment
Therefore, in the process of detecting the hydrophobic membrane structure, through the change of color, it is detected whether the hydrophobic membrane structure is damaged, so as to replace it in time, and solve the problem in the prior art that the hydrophobic membrane structure is only found to be damaged when there is a problem with the product or equipment

Method used

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  • Hydrophobic membrane structure, detection method and detection system thereof, and wafer carrier
  • Hydrophobic membrane structure, detection method and detection system thereof, and wafer carrier
  • Hydrophobic membrane structure, detection method and detection system thereof, and wafer carrier

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Embodiment Construction

[0025] In order to make the objects, technical solutions, and advantages of the present invention, various embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, one of ordinary skill in the art will appreciate that in various embodiments of the invention, many techniques are proposed in order to better understand the present application. However, even if there are no such techniques and various changes and modifications based on the following embodiments, the technical solutions claimed in the present application can be implemented.

[0026] Since the immersion lithography process, it will be filled with a liquid between a projection lithography lens and wafer carrier, and then get smaller exposure size. Liquid on the projection lens would move with the movement of the lens. When the other edge of the slit or slot structure having engagement structure is moved to the wafer carrier liquid, the projection lens is easy ...

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Abstract

The embodiment of the invention relates to the field of semiconductors, and discloses a hydrophobic membrane structure, a detection method and a detection system thereof, and a wafer carrier. The hydrophobic membrane structure provided by the invention comprises a color-changing layer and a hydrophobic layer covering the surface of the color-changing layer; and when the color-changing layer is in contact with liquid, the color of the area, in contact with the liquid, of the color-changing layer changes to form a color-changing area. Compared with the prior art, according to the embodiment, the hydrophobic layer covers the surface of the color-changing layer, when the hydrophobic layer is broken, liquid flows into the color-changing layer through the broken area of the hydrophobic layer, and the color of the color-changing layer changes due to the fact that the color-changing layer makes contact with the liquid. Therefore, in the detection process of the hydrophobic membrane structure, whether the hydrophobic membrane structure is damaged or not is detected through the change of the color, so that the hydrophobic membrane structure is replaced in time, and the problem that the hydrophobic membrane structure is damaged only when a product or equipment goes wrong is solved.

Description

Technical field [0001] Embodiment of the invention relates to the field of semiconductor, particularly to a hydrophobic film structure and detection method, the detection system, the wafer carrier. Background technique [0002] In the field of semiconductor technology, in particular in wafer fabrication process, a high cleanliness requirements for the wafer carrier, and therefore, the current practice is commonly disposed on the periphery of the wafer carrier and the other having a gap junction structure title hydrophobic membrane structures to prevent contamination of the wafer carrier, thus improving the yield of the wafer. Further, the prior art, the detection of the hydrophobic membrane structure needs the periodic PM (Preventive maintenance, production and maintenance) visual inspection of the structure of a hydrophobic membrane is broken. [0003] The inventor finds at least the following problems in the prior art: art, there is a problem only when the product or equipment ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09J7/29G01N21/78H01L21/683
CPCC09J7/29G01N21/78H01L21/683C09J2203/326G01N21/8803G01N21/88G01N21/81G03F7/70341G03F7/70916G03F7/707G03F7/7095G03F7/70816G03F7/7085
Inventor 何振凯
Owner CHANGXIN MEMORY TECH INC
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