Organic photovoltaic device preparation process based on metal nanoparticle magnetothermal effect annealing process
A technology of organic photovoltaic devices and metal nanoparticles, which is applied in semiconductor/solid-state device manufacturing, photovoltaic power generation, electric solid-state devices, etc. Separation and transport, efficient preparation, inhibition of recombination effects
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Embodiment 1
[0021] 1. Clean the substrate composed of transparent substrate and transparent conductive cathode ITO with surface roughness less than 1nm, and dry it with nitrogen after cleaning;
[0022] 2. Spin-coat ZnO on the surface of the transparent conductive cathode ITO; the rotation speed is 5000rpm, the time is 50s, the thickness of the coating is 40nm, the cathode buffer layer is prepared, and the formed film is subjected to thermal annealing treatment, the temperature of thermal annealing treatment at 200°C for 2 hours;
[0023] 3. Drop PM6:Y6 solution on the cathode buffer layer, the ratio of PM6:Y6 is 1:1, the solution concentration is 6mg / ml, and the photoactive layer is prepared by spin coating process, the rotation speed is 4000rpm, and the time is 40s. The thickness of the coating is 90nm;
[0024] 4. Place the PM6:Y6 photoactive layer on a constant temperature hot stage at 90°C for 10 minutes in an atmospheric environment;
[0025] 5. An anode buffer layer MoO3 is evapo...
Embodiment 2
[0029] 1. Clean the substrate composed of transparent substrate and transparent conductive cathode ITO with surface roughness less than 1nm, and dry it with nitrogen after cleaning;
[0030] 2. Spin-coat ZnO on the surface of the transparent conductive cathode ITO to prepare the cathode buffer layer; the rotation speed is 5000rpm, the time is 50s, the thickness of the coating is 40nm, and the formed film is subjected to thermal annealing treatment. The temperature of the thermal annealing treatment is 200 ℃, time is 2H;
[0031] 3. The mixed photoactive layer is prepared by spin coating, and the PM6:Y6:Fe3O4 solution is coated on the mixed photoactive layer. The ratio of PM6:Y6:Fe3O4 in the PM6:Y6:Fe3O4 solution is 1:1:0.1; the solution concentration is 6mg / ml, the rotation speed during spin coating is 4000rpm, the time is 40s, and the coating thickness is 110nm;
[0032] 4. In the atmospheric environment, place the PM6:Y6:Fe3O4 photoactive layer in a conductive coil with an ...
Embodiment 3
[0037] 1. Clean the substrate composed of transparent substrate and transparent conductive cathode ITO with surface roughness less than 1nm, and dry it with nitrogen after cleaning;
[0038] 2. Spin-coat ZnO on the surface of the transparent conductive cathode ITO to prepare the cathode buffer layer. The rotation speed is 5000rpm, and the time is 50s. The thickness of ZnO coating is 40nm, and the formed film is thermally annealed; the annealing temperature is 200°C , the annealing time is 2H;
[0039] 3. The mixed photoactive layer is prepared by spin coating, and the PM6:Y6:Fe3O4 solution is coated on the mixed photoactive layer. The ratio of PM6:Y6:Fe3O4 in the PM6:Y6:Fe3O4 solution is 1:1:0.2, and the concentration of the solution is 6mg / ml, the rotation speed is 4000rpm, the time is 40s, and the thickness of the coating is 110nm;
[0040] 4. In the atmospheric environment, place the PM6:Y6:Fe3O4 photoactive layer in a conductive coil with an alternating current for magnet...
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