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Helicon wave-ion cyclotron resonance coupling discharge system

An ion cyclotron resonance and helical wave technology is applied in the field of coupling discharge, which can solve problems such as low heating efficiency, and achieve the effects of improving coupling efficiency, avoiding etching damage and reducing power loss.

Pending Publication Date: 2021-07-16
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

In addition, electrodeless microwave heating of plasma has also been applied to plasma research. The microwave heating method has a more obvious effect on electron heating, and a higher ion temperature is obtained through the collision of hot electrons and ions. This method has a lower heating effect. efficiency

Method used

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  • Helicon wave-ion cyclotron resonance coupling discharge system

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Embodiment Construction

[0017] See attached picture.

[0018] Combine below figure 1 The present invention is described in further detail with specific examples. A helicon wave-ion cyclotron resonance coupling discharge system of the present invention is not limited to specific materials or processes, the following cases are only one of the implementation cases of the present invention, and are not intended to limit the present invention. Any modification, equivalent replacement and improvement made within the spirit and principle of the invention shall be included in the protection scope of the present invention.

[0019] Such as figure 1 As shown, a helicon wave-ion cyclotron resonance coupling discharge system, said system includes: intake pipe 1, air intake seal 2, helicon wave discharge chamber 3, discharge tube 4, helicon wave antenna 5, isolation plate 6, ion Cyclone heating chamber 7, ion cyclotron antenna 8, diffusion partition 9, diffusion seal 10, diffusion chamber 11, diffusion pump po...

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Abstract

The invention discloses a helicon wave-ion cyclotron resonance coupling discharge system which structurally comprises an air inlet pipeline (1), an air inlet seal (2), a helicon wave discharge chamber (3), a discharge tube (4), a helicon wave antenna (5), an isolation plate (6), an ion cyclotron heating chamber (7), an ion cyclotron antenna (8), a diffusion partition plate (9), a diffusion seal (10), a diffusion chamber (11), a diffusion pump port (12), a magnet coil (13) and an antenna pump port (14). According to the system, high-density and high-temperature plasma ionization excitation and heating integration is realized. The plasma excitation antenna and the heating antenna are arranged in a vacuum environment, the power loss of the antennas is effectively reduced, the safety of equipment operation is improved, physical isolation is arranged between plasma excitation and heating, the mutual interference of electromagnetic waves of the two can be effectively reduced, and the plasma coupling efficiency is improved. By adjusting the power ratio of excitation to heating, the electron density of the plasma can be controlled to be 10<15>-10<19> m<-3 >, the ion temperature is 0-100eV, and pulse / continuous discharge is realized.

Description

technical field [0001] The invention relates to a coupled discharge technology applied to high-density plasma excitation-heating, and mainly relates to a helicon wave-ion cyclotron resonance coupled discharge system. Background technique [0002] As the fourth state of matter, plasma is also one of the main technologies for fusion energy and industrial development. In recent years, it has attracted the attention of scientific research institutions and enterprises around the world. The electron density and ion energy in the plasma, as the main technical indicators to measure the state of the plasma, have always been the direction of continuous breakthroughs in the field of plasma source research. High-density plasma is mainly obtained by means of direct current, radio frequency, microwave and laser through ionized discharge gas. However, due to the influence of ionization rate and discharge parameters, helicon wave plasma, as a discharge mode that can theoretically obtain 10...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24H05H1/46H05H1/16
CPCH05H1/24H05H1/46H05H1/16
Inventor 苌磊袁小刚杨鑫周海山罗广南
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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