Repairing and soothing skin care product containing metagen component and preparation method thereof
A skin care product and epigenetic technology, applied in the field of repairing and soothing skin care products and its preparation, can solve the problems of no obvious effect, limited purchasing factors, cumbersome operation technology, etc., achieve bioavailability improvement, solve multi-dimensional skin problems, Improve metabolism
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0053] A repairing and soothing skin care product containing postbiotic ingredients, comprising the following components in mass percentages:
[0054] Postbiotic ingredients: 1.0%;
[0055] The postbiotic products are tested, and the specific content of each component is obtained as follows:
[0056] Antibacterial substances: Lactic acid 501μg / g, citric acid 1882μg / g, malic acid 95.3μg / g, phenyllactic acid 28.1μg / g, succinic acid 14.5μg / g, 4-hydroxyphenyllactic acid 21.3μg / g, salicylic acid 0.11μg / g, vanillic acid 0.56μg / g, phenylpropionic acid 0.22μg / g, tartaric acid 0.05μg / g;
[0057] Short-chain fatty acids: acetic acid 60 μg / g, propionic acid 7.1 μg / g, butyric acid 11.2 μg / g, valeric acid 2.1 μg / g, caproic acid 2.5 μg / g;
[0058] Active metabolites: lauryldiethanolamine 4168μg / g, soybean saponin 285μg / g, soybean isoflavone 252μg / g, malonyl genistin 211μg / g, 3-indoleacrylic acid 192μg / g, genistein 214μg / g , Hyaluronic acid 85.7μg / g, exopolysaccharide 355μg / g, polypeptid...
Embodiment 2
[0073] A repairing and soothing skin care product containing postbiotic ingredients, comprising the following components in mass percentages:
[0074] Postbiotic ingredients: 3.0%,
[0075] The postbiotic products are tested, and the specific content of each component is obtained as follows:
[0076] Antibacterial substances include lactic acid 550μg / g, citric acid 1948μg / g, malic acid 105μg / g, phenyllactic acid 31.2μg / g, succinic acid 15μg / g, 4-hydroxyphenyllactic acid 21.8μg / g, salicylic acid 0.17μg / g , vanillic acid 0.52μg / g, phenylpropionic acid 0.25μg / g, tartaric acid 0.09μg / g;
[0077] Short-chain fatty acids include acetic acid 65 μg / g, propionic acid 7.5 μg / g, butyric acid 11.5 μg / g, valeric acid 2.3 μg / g, caproic acid 2.8 μg / g;
[0078] Active metabolites include lauryldiethanolamine 4107μg / g, soybean saponin 2802μg / g, soybean isoflavone 260μg / g, malonyl genistin 219μg / g, 3-indoleacrylic acid 195μg / g, genistein 210μg / g , Hyaluronic acid 90μg / g, exopolysaccharide 34...
Embodiment 3
[0093] A repairing and soothing skin care product containing postbiotic ingredients, comprising the following components in mass percentages:
[0094] Postbiotic ingredients: 5.0%,
[0095] The postbiotic products are tested, and the specific content of each component is obtained as follows:
[0096]Antibacterial substances include lactic acid 530μg / g, citric acid 1910μg / g, malic acid 99μg / g, phenyllactic acid 30μg / g, succinic acid 14.7μg / g, 4-hydroxyphenyllactic acid 21.5μg / g, salicylic acid 0.15μg / g , vanillic acid 0.68μg / g, phenylpropionic acid 0.24μg / g, tartaric acid 0.08μg / g;
[0097] Short-chain fatty acids include acetic acid 62 μg / g, propionic acid 74 μg / g, butyric acid 11.5 μg / g, valeric acid 2.3 μg / g, caproic acid 3 μg / g;
[0098] Active metabolites include lauryldiethanolamine 4128μg / g, soybean saponin 289μg / g, soybean isoflavone 256μg / g, malonyl genistin 217μg / g, 3-indoleacrylic acid 193μg / g, genistein 214μg / g , Hyaluronic acid 88μg / g, exopolysaccharide 347μg / g,...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com