Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Manufacturing method of quantum dot color filter and display panel

A technology for color filters and manufacturing methods, which is applied in the direction of filters, instruments, electrical components, etc., can solve the problems of poor reliability and QD material light efficiency decline, and achieve the goal of improving contrast, high resolution, and satisfying resolution Effect

Active Publication Date: 2021-05-28
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF6 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, the use of QD PR (Quantum Dot Photoresist, quantum dot photoresist) lithography technology to produce QDCF will be affected by the decrease in light efficiency and poor reliability of QD materials; while the use of QD IJP (Quantum Dot Ink JetPrinting, quantum dot inkjet Printing) technology to make QDCF will be limited by large size and high resolution technology

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Manufacturing method of quantum dot color filter and display panel
  • Manufacturing method of quantum dot color filter and display panel
  • Manufacturing method of quantum dot color filter and display panel

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0042] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Apparently, the described embodiments are only some of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application.

[0043] In the description of the present application, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Orientation indicated by rear, left, right, vertical, horizontal, top, bottom, inside, outside, clockwise, counterclockwise, etc. The positional relationship is based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a manufacturing method of a quantum dot color filter and a display panel. The manufacturing method of the quantum dot color filter comprises the following steps: manufacturing a first substrate, wherein the first substrate comprises a first substrate, and a surface treatment film and a quantum dot film which are sequentially arranged on the first substrate; manufacturing a second substrate, wherein the second substrate comprises a second substrate and a color resistance layer arranged on the second substrate; arranging the first substrate and the second substrate oppositely, and enabling the quantum dot film to be in contact with the color resistance layer; and stripping the second substrate from the first substrate, and enabling the quantum dot film in contact with the color resistance layer to be transferred to the color resistance layer, wherein the stripping force between the quantum dot film and the color resistance layer is greater than the stripping force between the quantum dot film and the surface treatment film. The quantum dot color filter with high energy efficiency, high resolution and high contrast can be obtained, and mass production of the display panel containing the quantum dot color filter can be realized.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a method for manufacturing a quantum dot color filter and a display panel. Background technique [0002] Quantum dot color filter (Quantum Dot Color Filter, QDCF) has the technical characteristics of high color gamut and wide viewing angle, with Mini LED (Light-Emitting Diode, light-emitting diode), Micro LED, OLED (Organic Light-Emitting Diode, organic light-emitting Diode) backlight technology can show excellent picture quality and is the most competitive product in the future display technology. [0003] At present, the display technology using QDCF has no mass products, and one of the main reasons is that the existing QDCF manufacturing process has defects. For example, the use of QD PR (Quantum Dot Photoresist, quantum dot photoresist) lithography technology to produce QDCF will be affected by the decrease in light efficiency and poor reliability of QD materials;...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G09F9/33G02B5/20H01L33/58H01L27/15
CPCG09F9/33G02B5/20H01L33/58H01L27/156H01L2933/0058
Inventor 周淼陈珍霞
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com