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Etching solution for processing CD patterns of camera lens and use method thereof

A camera and etching solution technology, applied in the etching solution field, can solve the problems of short thinning time, low pass-through rate, and small equipment investment.

Inactive Publication Date: 2021-05-28
HUIZHOU CITY QINGYANG IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There are two commonly used thinning methods, one is the physical method, that is, using polishing powder for grinding and polishing, this method takes a long time to thin, the precision is not easy to control, and the product yield is low; the other method is the chemical etching method , this method has short thinning time, small equipment investment, high product yield, simple composition of thinning liquid, and low cost, and has gradually become the mainstream technical method of thinning
The etching solution in the prior art, in the etching process, will enlarge the defects such as pits and scratches on the surface of the mobile phone lens during laser processing, and the pass-through rate is low. In the later stage, all the mobile phone lenses need to be ground again to overcome the defects. Surface defects
[0003] In the prior art, in the CD pattern of the camera lens of the mobile phone, the commonly used processes are silk screen printing and transfer printing. After zooming in, the lines are not neat, the texture of the product is not clear enough, and the precision is not enough
Secondly, the texture obtained by silk screen printing and transfer printing is raised, the service life of the product is not long, and there is a hidden danger of texture falling off

Method used

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  • Etching solution for processing CD patterns of camera lens and use method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] A kind of etchant for processing the CD pattern of the camera lens is calculated in parts by weight, and its preparation raw materials include: 2 parts of hydrofluoric acid solution, 6 parts of sulfuric acid solution, 5 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 84 parts of water.

[0020] Wherein, the weight fraction of the hydrofluoric acid molecules contained in the hydrofluoric acid solution is 10wt%, the chloride content contained in the hydrofluoric acid solution is 0.001wt%, and the sulfuric acid contained in the hydrofluoric acid solution Salt content is 0.002wt%

[0021] Wherein, the weight fraction of the sulfuric acid molecule contained in the sulfuric acid solution is 75wt%

[0022] Wherein, the content of HCl molecules in the hydrochloric acid solution is 10wt%.

[0023] Wherein, the content of acetic acid molecule in the acetic acid solution is 36wt%.

[0024] A method for processing etchant for CD pattern of camera lens, c...

Embodiment 2

[0030] A kind of etchant for processing the CD pattern of the camera lens is calculated in parts by weight, and its preparation raw materials include: 2.5 parts of hydrofluoric acid solution, 6 parts of sulfuric acid solution, 5 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 83.5 parts of water.

[0031] Wherein, the weight fraction of the hydrofluoric acid molecules contained in the hydrofluoric acid solution is 20wt%, the chloride content contained in the hydrofluoric acid solution is 0.0005wt%, and the sulfuric acid contained in the hydrofluoric acid solution The content of salt is 0.001wt%

[0032] Wherein, the weight fraction of the sulfuric acid molecule contained in the sulfuric acid solution is 80wt%

[0033] Wherein, the content of HCl molecules in the hydrochloric acid solution is 15wt%.

[0034] Wherein, the content of acetic acid molecules in the acetic acid solution is 37wt%.

[0035] A method for processing etchant for CD pattern of c...

Embodiment 3

[0041] A kind of etchant for processing the CD pattern of the camera lens is calculated in parts by weight, and its preparation raw materials include: 3 parts of hydrofluoric acid solution, 8 parts of sulfuric acid solution, 6 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 80 parts of water.

[0042] Wherein, the weight fraction of the hydrofluoric acid molecules contained in the hydrofluoric acid solution is 30wt%, the chloride content contained in the hydrofluoric acid solution is 0.001wt%, and the sulfuric acid contained in the hydrofluoric acid solution Salt content is 0.002wt%

[0043] Wherein, the weight fraction of the sulfuric acid molecule contained in the sulfuric acid solution is 90wt%

[0044] Wherein, the content of HCl molecules in the hydrochloric acid solution is 20wt%.

[0045] Wherein, the content of acetic acid molecules in the acetic acid solution is 38wt%.

[0046] A method for processing etchant for CD pattern of camera lens, ...

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Abstract

The invention provides an etching solution for processing CD patterns of a camera lens and a use method thereof. The etching solution for processing the CD patterns of the camera lens is prepared from 2-4 parts of a hydrofluoric acid solution, 6-8 parts of a sulfuric acid solution, 5-6 parts of a hydrochloric acid solution, 3 parts of an acetic acid solution and 79-84 parts of water, and the method is used for processing the surface of the camera lens product. The patterns of the lens of the camera generate metal reflection so that the patterns are clearer, the lines are more perfect, the texture is better, and the product is higher in grade.

Description

technical field [0001] The invention relates to the technical field of etchant, in particular to an etchant for treating camera lens CD lines and a method for using the same. Background technique [0002] Laser technology has the advantages of fast speed, high precision and high efficiency. In recent years, it has been gradually used in the field of mobile phone lens processing. After laser processing, the mobile phone lens needs to be thinned. There are two commonly used thinning methods, one is physical method, that is, using polishing powder for grinding and polishing, this method takes a long time to thin, the precision is not easy to control, and the product yield is low; the other method is chemical etching method , This method has short thinning time, small equipment investment, high product yield, simple composition of thinning liquid, and low cost, and has gradually become the mainstream technical method of thinning. The etchant in the prior art, in the etching pro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00C09K13/08
CPCC03C15/00C09K13/08
Inventor 郑资来刘克山
Owner HUIZHOU CITY QINGYANG IND
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