Etching solution for processing CD patterns of camera lens and use method thereof
A camera and etching solution technology, applied in the etching solution field, can solve the problems of short thinning time, low pass-through rate, and small equipment investment.
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Embodiment 1
[0019] A kind of etchant for processing the CD pattern of the camera lens is calculated in parts by weight, and its preparation raw materials include: 2 parts of hydrofluoric acid solution, 6 parts of sulfuric acid solution, 5 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 84 parts of water.
[0020] Wherein, the weight fraction of the hydrofluoric acid molecules contained in the hydrofluoric acid solution is 10wt%, the chloride content contained in the hydrofluoric acid solution is 0.001wt%, and the sulfuric acid contained in the hydrofluoric acid solution Salt content is 0.002wt%
[0021] Wherein, the weight fraction of the sulfuric acid molecule contained in the sulfuric acid solution is 75wt%
[0022] Wherein, the content of HCl molecules in the hydrochloric acid solution is 10wt%.
[0023] Wherein, the content of acetic acid molecule in the acetic acid solution is 36wt%.
[0024] A method for processing etchant for CD pattern of camera lens, c...
Embodiment 2
[0030] A kind of etchant for processing the CD pattern of the camera lens is calculated in parts by weight, and its preparation raw materials include: 2.5 parts of hydrofluoric acid solution, 6 parts of sulfuric acid solution, 5 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 83.5 parts of water.
[0031] Wherein, the weight fraction of the hydrofluoric acid molecules contained in the hydrofluoric acid solution is 20wt%, the chloride content contained in the hydrofluoric acid solution is 0.0005wt%, and the sulfuric acid contained in the hydrofluoric acid solution The content of salt is 0.001wt%
[0032] Wherein, the weight fraction of the sulfuric acid molecule contained in the sulfuric acid solution is 80wt%
[0033] Wherein, the content of HCl molecules in the hydrochloric acid solution is 15wt%.
[0034] Wherein, the content of acetic acid molecules in the acetic acid solution is 37wt%.
[0035] A method for processing etchant for CD pattern of c...
Embodiment 3
[0041] A kind of etchant for processing the CD pattern of the camera lens is calculated in parts by weight, and its preparation raw materials include: 3 parts of hydrofluoric acid solution, 8 parts of sulfuric acid solution, 6 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 80 parts of water.
[0042] Wherein, the weight fraction of the hydrofluoric acid molecules contained in the hydrofluoric acid solution is 30wt%, the chloride content contained in the hydrofluoric acid solution is 0.001wt%, and the sulfuric acid contained in the hydrofluoric acid solution Salt content is 0.002wt%
[0043] Wherein, the weight fraction of the sulfuric acid molecule contained in the sulfuric acid solution is 90wt%
[0044] Wherein, the content of HCl molecules in the hydrochloric acid solution is 20wt%.
[0045] Wherein, the content of acetic acid molecules in the acetic acid solution is 38wt%.
[0046] A method for processing etchant for CD pattern of camera lens, ...
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