Base horizontal adjustment device for epitaxial film growth equipment

Abstract

The invention discloses a base horizontal adjustment device for epitaxial film growth equipment. The device comprises a base horizontal adjustment device body consisting of a gradienter body, a hollowmetal ball, a motor fixing rod, a first horizontal adjustment screw, a second horizontal adjustment screw, a first puller screw and a second puller screw, an installation opening is formed in the middle of the gradienter body, two sets of threaded guide grooves are formed in the outer side of the gradienter body, the installation opening is communicated with the two sets of threaded guide grooves, the hollow metal ball is movably arranged in the installation opening, and a butt-joint notch is vertically formed in the middle of the hollow metal ball. Under the condition that the general structure of a base gradienter is not changed, the first puller screw and a hollow sphere are additionally arranged, the first puller screw is additionally arranged, instability of the base caused by sliding displacement of the horizontal adjustment screw can be prevented, the hollow sphere is additionally arranged, and the hollow sphere sleeves the tail of the fixing rod. Abrasion caused by direct contact between the tail of the horizontal adjustment screw and the motor fixing rod is avoided.

Description

technical field [0001] The invention relates to the technical field of epitaxial film growth equipment, in particular to a base level adjustment device for epitaxial film growth equipment. Background technique [0002] Epitaxial growth technology was developed in the late 1950s and early 1960s. At that time, in order to manufacture high-frequency and high-power devices, it was necessary to reduce the collector series resistance, and the material was required to withstand high voltage and high current. Therefore, it was necessary to grow a thin high-resistance epitaxial layer on a low-resistance substrate. At this time, epitaxial equipment It came into being. In view of the status quo of the base level adjustment device of the existing epitaxial equipment, the base level is adjusted by adjusting the two level adjustment screws of the base level, and the base is fixedly connected with the motor fixing rod coaxially, so by Adjust the position of the motor fixing rod to indire...

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Problems solved by technology

[0004] The object of the present invention is to provide a base level adjustment device for epitaxial film growth equipment, which solves the problem that the two adjustment screws are not fixed by tightening the screw one when adjusting the horizontal position of the epitaxial base, and the base rotates After a period of time, there will be a slight displacement problem, which will cause the position of the base to shift left and right, front and rear, and the film thickness and resistivity of the wafer will change, thereby reducing the product yield. This technical problem

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