Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Facial mask essence based on live yeast and plant extract and preparation method thereof and facial mask

A technology of plant extracts and yeast extracts, which is applied in skin care preparations, pharmaceutical formulas, cosmetic preparations, etc., can solve the problems of yeast's difficulty in balancing the efficacy and anti-allergy, and solve the problem of sagging skin, low irritation, The effect of widening the scope of application

Pending Publication Date: 2021-02-09
上海茵派化妆品有限公司
View PDF7 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In view of the shortcomings of the prior art described above, the object of the present invention is to provide a facial mask essence based on live yeast and plant extracts, which is used to solve the problem of difficult balance of efficacy and anti-allergic effects of yeast in cosmetics in the prior art, Simultaneously, the present invention will also provide a kind of preparation method of facial mask essence based on live yeast and plant extract; In addition, the present invention will also provide a kind of facial mask based on live yeast and plant extract

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Facial mask essence based on live yeast and plant extract and preparation method thereof and facial mask
  • Facial mask essence based on live yeast and plant extract and preparation method thereof and facial mask
  • Facial mask essence based on live yeast and plant extract and preparation method thereof and facial mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0042] The implementation of the present invention will be illustrated by specific specific examples below, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification.

[0043] A mask essence based on live yeast and plant extracts, the mask essence includes the following components in parts by weight: 1-5 parts of yeast extract, 1-5 parts of ceramide, 10-20 parts of Plant extract, 20-40 parts of moisturizing agent, 1-5 parts of anti-wrinkle agent, 1-5 parts of soothing agent, 5-10 parts of conditioning agent, 0.5-5.0 parts of preservative, 10-20 parts of Emollient, 0.5-1.0 parts of stabilizer, 20-30 parts of purified water.

[0044] The components of the mask essence in Examples 1 to 4 and Comparative Examples 1 to 2 are shown in Tables 1 to 11, wherein Comparative Example 1 does not add ceramide and plant extracts compared to Example 4, Compared with Example 4, Comparative Example...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention relates to the technical field of facial mask essence, in particular to facial mask essence based on live yeast and a plant extract. The facial mask essence comprises 1-5 parts of a yeast extract, 1-5 parts of ceramide, 10-20 parts of a plant extract, 20-40 parts of a humectant, 1-5 parts of an anti-wrinkle agent, 1-5 parts of an allergy relieving agent, 5-10 parts of a conditioner, 0.5-5.0 parts of a preservative, 10-20 parts of a softener, 0.5-1.0 part of a stabilizer and 20-30 parts of purified water. A preparation method comprises the following steps: grinding the yeast extract, mixing active components, and finally adding assistants to obtain a finished product. The facial mask essence can be used in cooperation with facial mask paper. The facial mask essence solves a problem that in the prior art, yeast is difficult to balance efficacy and allergy-resistance in cosmetics, and has good effects and also relatively high allergy-relieving property through balanced proportioning.

Description

technical field [0001] The invention relates to the technical field of mask essence, in particular to a mask essence based on live yeast and plant extracts, a preparation method and a mask. Background technique [0002] Mask is a carrier of beauty care products. At present, powder blending, kaolin, non-woven fabric, silk mask, tencel mask, bio-cellulose mask, and non-woven mask materials are widely used. Superconducting film mask is the latest generation of innovative technology. Mask is a category in skin care products. Its most basic and most important purpose is to make up for the insufficient cleansing work of makeup remover and face wash, and on this basis, cooperate with other essence ingredients to achieve other maintenance functions, such as moisturizing, whitening, anti-aging, balancing oil, etc. [0003] The principle of the mask is to use the short time covered on the face to temporarily isolate the outside air and pollution, increase the temperature of the skin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61K8/9728A61K8/68A61K8/9794A61K8/9789A61Q19/00A61Q19/02A61Q19/08
CPCA61K8/9728A61K8/68A61K8/9794A61K8/9789A61Q19/00A61Q19/005A61Q19/02A61Q19/08
Inventor 姜莱莱
Owner 上海茵派化妆品有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products