High-purity gas buffering, adjusting and conveying cabinet

Abstract

The invention belongs to the technical field of chemical gas storage and control, and particularly relates to a high-purity gas buffering, adjusting and conveying cabinet. Detachable partition platesand pipeline mounting plates are adopted, so that gas elements in different functional areas can be conveniently mounted, overhauled and replaced under the condition that the gas cabinet is very small; with the combination of heat preservation units and sealing strips, gas and temperature environments in different unit areas are kept independent, fine temperature control of each functional area isensured, in addition, particles cannot be generated in used materials, and thus the cleanliness is ensured; high-purity nitrogen is adopted to keep micro-positive pressure for each functional area, so that dust and water vapor in the air can be prevented from entering the cabinet body, and a high-cleanliness and low-humidity environment is created for the gas elements; and exhaust outlets are adopted, so that when leakage is detected, the exhaust outlets can be opened in time for exhausting without opening a cabinet door, and thus environmental pollution and harm to operators are reduced as much as possible.

Description

technical field [0001] The invention belongs to the technical field of chemical gas storage and control, and more specifically relates to a high-purity gas storage, adjustment and delivery cabinet. Background technique [0002] In the field of optical fiber preform preparation or pan-semiconductor preparation, silicon tetrachloride, germanium tetrachloride, phosphorus oxychloride, oxygen, helium, Freon, chlorine and other high-purity gas raw materials are often used. In order to carry out the process accurately, these gases need to be filtered, pressure adjusted, flow controlled, valve controlled, etc., and flow control requires the gas to be within a constant temperature range. In addition, silicon tetrachloride, germanium tetrachloride, phosphorus oxychloride, etc. are in a liquid state at room temperature. Whether it is through carrier gas or direct evaporation, the buffer tank needs to be heated and kept warm. [0003] The existing high-purity gas storage, adjustment, a...

AI Technical Summary

Problems solved by technology

Since each compartment is fixed, it is extremely inconvenient to maintain, repair, and replace various pressure regulating valves, filters, hand valves, pneumatic valves, mass flow meters, and buffer tanks after the first installation; moreover The above-mentioned gas components and high-purity gases used need a high-clean and low-humidity environment; in addition, if silicon tetrachloride, germanium tetrachloride, phosphorus oxychloride, etc. leak, they will be extremely corrosive or extremely Strong toxicity, there is a great safety hazard

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