Photoelectric detector for paper-based material and solution method for preparing photoelectric detector
A photodetector and solution method technology, which is applied to the authenticity inspection of banknotes, instruments, circuits, etc., can solve the problems of complicated preparation process and high equipment cost, and achieve the effects of simple process, high sensitivity and low preparation cost.
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Embodiment 1
[0036] Based on SnO 2 :10at.%Si / SnO 2 : 10at.% Ga homojunction structure of the near-ultraviolet photodetector preparation process is as follows:
[0037] (1), take appropriate amount of SnCl respectively 2 2H 2 O and tetraethyl silicate (TEOS), gallium nitrate hydrate (Ga(NO 3 ) 3 ·xH 2 O) Dissolved in absolute ethanol, SnO with a tin concentration of 0.5mol / L, a silicon doping ratio of 10at.%, and a gallium doping concentration of 10at.%. 2 : Si, SnO 2 : Ga precursor solution, the solution is sealed and placed in a magnetic stirrer to fully stir for 48h to make it even for later use. Filter the solution with a 0.22 μm caliber organic needle filter to remove insoluble particles and avoid the formation of particulate impurities. Then the solution was sonicated for 10 min to remove air bubbles for later use.
[0038] (2) Treat the clean ITO substrate plasma for 10 minutes with a power of 120W. Take 50uLSnO 2 : Ga solution is dropped on the substrate, and the film is ...
Embodiment 2
[0042]Based on SnO 2 :15at.%Si / SnO 2 : 10at.% Ga homojunction structure of the near-ultraviolet photodetector preparation process is as follows:
[0043] (1), take appropriate amount of SnCl respectively 2 2H 2 O and tetraethyl silicate (TEOS), gallium nitrate hydrate (Ga(NO 3 ) 3 ·xH 2 O) Dissolved in absolute ethanol, SnO with a tin concentration of 0.5mol / L, a silicon doping ratio of 15at.%, and a gallium doping concentration of 10at.% 2 : Si, SnO 2 : Ga precursor solution, the solution is sealed and placed in a magnetic stirrer to fully stir for 48h to make it even for later use. Filter the solution with a 0.22 μm caliber organic needle filter to remove insoluble particles and avoid the formation of particulate impurities. Then the solution was sonicated for 10 min to remove air bubbles for later use.
[0044] (2) Treat the clean ITO substrate plasma for 10 minutes with a power of 120W. Take 50uLSnO 2 : Ga solution is dropped on the substrate, and the film is fo...
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