Photoelectric monolithic integration system based on multi-material system
A monolithic integration, multi-material technology, applied in the direction of light guide, optics, optical components, etc., can solve the problems of high monolithic integration cost of indium phosphide, large loss of silicon-based modulator, difficulty in large-scale integration, etc., and achieve excellent electro-optic Effects of Performance, Improved Performance, Low Polarization Sensitivity
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[0046] The following is a detailed description of the embodiments of the present invention: this embodiment is implemented on the premise of the technical solution of the present invention, and provides detailed implementation methods and specific operation processes. It should be noted that those skilled in the art can make several modifications and improvements without departing from the concept of the present invention, and these all belong to the protection scope of the present invention.
[0047] An embodiment of the present invention provides a photoelectric monolithic integrated system based on a multi-material system, including: a silicon substrate layer, a lithium niobate thin film layer, a silicon nitride thin film layer and a silicon thin film layer, an indium phosphide thin film layer, and a germanium thin film layer . Between the silicon substrate layer and the lithium niobate thin film layer, between the lithium niobate thin film layer and the silicon nitride thi...
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