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Preparation method of high-temperature surface source radiation source

A radiation source and high-temperature surface technology, which is applied in the field of thermal radiation measurement, can solve the problems that the surface source radiation source cannot meet the emissivity requirements, and achieve precise and controllable laser parameters and translation stage parameters, high process repeatability, and improved optical efficiency. absorption effect

Inactive Publication Date: 2020-04-28
BEIJING CHANGCHENG INST OF METROLOGY & MEASUREMENT AVIATION IND CORP OF CHINA
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  • Application Information

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Problems solved by technology

[0005] The purpose of the present invention is to provide a method for preparing a high-temperature surface source radiation source in order to solve the problem that the surface source radiation source processed by the existing processing method cannot meet the emissivity requirement

Method used

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  • Preparation method of high-temperature surface source radiation source
  • Preparation method of high-temperature surface source radiation source
  • Preparation method of high-temperature surface source radiation source

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Embodiment 1

[0024] A method for preparing a high-temperature surface source radiation source, comprising the following steps in an embodiment of the method:

[0025] Step 1: Select an aluminum material as the surface source radiation source substrate, the thickness of the aluminum substrate material is 10mm, and clean the surface of the substrate.

[0026] Step 2: Prepare a uniform microstructure on the surface of the substrate by femtosecond laser micromachining technology.

[0027] Step 3: Coating a layer of 10nm thick high temperature resistant paint on the surface of the microstructure substrate.

[0028] The parameters of the femtosecond laser in the above step 2 are pulse width 50fs, repetition frequency 1kHz, and maximum average power 3W. In actual work, the laser output power is 100mW, and the spot diameter is 200μm. Under this condition, the laser energy density is 3.18kJ / m 2 . When the microstructure is prepared, the movement of the three-dimensional translation stage is cont...

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Abstract

The invention, which belongs to the field of thermal radiation measurement, relates to a preparation method of a high-temperature surface source radiation source. The invention provides a preparationmethod of a high-temperature surface source radiation source by introducing an ultrafast laser micromachining technology. A proper material is selected as a substrate of the surface source radiation source, and then a specific structure is formed on the surface of the substrate by using an ultrafast laser processing method. In the machining process, the laser energy is adjusted to be larger than an etching threshold value of the substrate material and a scanning interval and ae scanning speed of a three-dimensional translation table are controlled through a computer; laser parameters and translation table parameters in the whole process are accurate and controllable, and the process repeatability is high. The surface of the substrate subjected to ultrafast laser processing has a particle structure with alternate sizes; the particle structure has a strong light trapping effect, light absorption can be effectively improved; a high-temperature-resistant coating is coated and thus the prepared surface source radiation source has high spectral emissivity at a high temperature, and the average spectral emissivity of the surface source radiation source is greater than 0.95 at a temperature of 450 DEG C.

Description

technical field [0001] The invention relates to a method for preparing a high-temperature surface source radiation source, belonging to the field of thermal radiation measurement. Background technique [0002] As the core equipment for the calibration of infrared instruments, the infrared radiation source is widely used in various key technical indicators and performance evaluations involving infrared thermal imaging cameras or infrared spectroscopy instruments in medical, construction, and environmental monitoring. Radiation sources are divided into surface source radiation sources and blackbody radiation sources. Blackbody radiation sources are limited by the current manufacturing level, and their apertures are generally not larger than 60mm. Surface source radiation sources have large apertures, generally above 100mm. Due to the source size effect of the radiation thermometer, the source size effect is caused by the imperfect design of the optical system. The radiation so...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01J5/00
CPCG01J5/00G01J5/80
Inventor 李维温悦武腾飞蔡静
Owner BEIJING CHANGCHENG INST OF METROLOGY & MEASUREMENT AVIATION IND CORP OF CHINA
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