Preparation methods of polycrystalline silicon wafer texturing liquid and black silicon material and application of polycrystalline silicon wafer texturing liquid and black silicon material in accelerating LeTID recovery of PERC battery
A technology for polycrystalline silicon wafers and texturing liquid, which is applied in chemical instruments and methods, sustainable manufacturing/processing, circuits, etc., can solve the problems of complicated steps, high cost, environmental pollution, etc., and achieves streamlined process, low cost, and environmental friendliness. Effect
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Embodiment 1
[0057] A polysilicon texturing liquid, the preparation method is as follows:
[0058] (1) Take 1 mL of PNVA aqueous solution and dissolve it in 8 mL of water;
[0059] (2) Take 16mL of HF aqueous solution, Mn(NO 3 ) 2 64mL of the aqueous solution, join in the solution that step (1) obtains, mix uniformly, obtain polysilicon texturing liquid (wherein, the molar concentration of HF is 4.24mol / L, Mn(NO 3 ) 2 The molar concentration is 3.1mol / L).
[0060] A kind of black silicon material, preparation method is as follows:
[0061] (1) Place the prepared polysilicon texturing solution in a constant temperature water bath at 25°C;
[0062] (2) Etching the polysilicon wafer in the above-mentioned polysilicon wafer texturing solution for 3 minutes;
[0063] (3) Cleaning the etched polysilicon wafer by RCA standard cleaning method to remove impurities and drying to obtain black silicon material.
[0064] figure 1 It is the scanning electron micrograph of the black silicon mater...
Embodiment 2
[0066] A polysilicon texturing liquid, the preparation method is as follows:
[0067] (1) Take 8 mL of PNVA aqueous solution and dissolve it in 16 mL of water;
[0068] (2) Take 16mL of HF aqueous solution, Mn(NO 3 ) 2 64mL of the aqueous solution of HF, join in the solution that step (1) obtains, mix uniformly, obtain polysilicon texturing liquid (wherein, the molar concentration of HF is 3.63mol / L, Mn(NO 3 ) 2 The molar concentration is 2.6mol / L).
[0069] A kind of black silicon material, preparation method is as follows:
[0070] (1) Place the prepared polysilicon texturing solution in a constant temperature water bath at 15°C;
[0071] (2) Etching the polysilicon wafer in the above-mentioned polysilicon wafer texturing solution for 3 minutes;
[0072] (3) Cleaning the etched polysilicon wafer by RCA standard cleaning method to remove impurities and drying to obtain black silicon material.
[0073] figure 2 It is the scanning electron micrograph of the black silic...
Embodiment 3
[0075] A polysilicon texturing liquid, the preparation method is as follows:
[0076] (1) Take 4 mL of the aqueous solution of PNVA and dissolve it in 8 mL of water;
[0077] (2) Take 16mL of HF aqueous solution, Mn(NO 3 ) 2 64mL of the aqueous solution, join in the solution that step (1) obtains, mix uniformly, obtain polysilicon texturing liquid (wherein, the molar concentration of HF is 4.24mol / L, Mn(NO 3 ) 2 The molar concentration is 3.1mol / L).
[0078] A kind of black silicon material, preparation method is as follows:
[0079] (1) Place the prepared polysilicon texturing solution in a constant temperature water bath at 18°C;
[0080] (2) Etching the polysilicon wafer in the above-mentioned polysilicon wafer texturing solution for 1 min;
[0081] (3) Cleaning the etched polysilicon wafer by RCA standard cleaning method to remove impurities and drying to obtain black silicon material.
[0082] image 3 It is the scanning electron micrograph of the black silicon ma...
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