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Drawing apparatus and drawing method

A technology of character data and data, applied in the field of drawing devices, can solve the problem of not being able to completely record exposure information and the like

Active Publication Date: 2020-01-31
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the amount of exposure information recorded by the manufacturing department is large, there is a problem that the required exposure information cannot be completely recorded in the secured information area.

Method used

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  • Drawing apparatus and drawing method
  • Drawing apparatus and drawing method
  • Drawing apparatus and drawing method

Examples

Experimental program
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Effect test

no. 1 approach

[0064] figure 1 It is a figure which shows the schematic structure of the drawing apparatus 1 of this invention. The drawing device 1 is a direct drawing device that sequentially performs partial exposure on a substrate S such as a printed circuit board by irradiating exposure laser light while scanning relatively, thereby drawing a desired circuit pattern on the substrate S. In addition, in figure 1 And in each of the following figures, the size and number of each part are exaggerated or simplified as necessary for easy understanding.

[0065] The drawing apparatus 1 has a data processing unit 2 that generates drawing data and an exposure unit 3 that draws (exposes) on a substrate S based on the drawing data, as main components. In addition, the data processing unit 2 and the exposure unit 3 may be provided integrally, or they may be provided physically separately if bidirectional data communication is possible. In addition, the pattern design device 4 is provided independ...

no. 2 approach

[0114] Next, a second embodiment of the present invention will be described. The overall structure of the drawing device of the second embodiment is the same as that of the first embodiment. In addition, the processing content of the drawing device in the second embodiment is also substantially the same as that in the first embodiment. The second embodiment differs from the first embodiment in that the character width is changed when the number of characters of the specified character is different from the maximum predetermined number of characters. That is, in the first embodiment, when the number of designated characters is less than the maximum predetermined number of characters, in the second embodiment, the character width of the character string is changed instead of the arrangement of the designated character string.

[0115] In the second embodiment, no image 3 The processing of step S64. Instead of this processing, the data combining unit 23 changes the character ...

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Abstract

The invention provides a drawing apparatus and a drawing method, which are capable of drawing required information in an information area. Pattern data (PD) recorded in a vector format is converted into a raster format, and corrected drawing data (HD) is generated by receiving correction processing based on deformation of a substrate (S). Specified character data (RD) representing exposure information is synthesized into the corrected drawing data (HD) and final drawing data (DD) is generated. In an exposure unit (3), a laser beam modulated on the basis of final drawing data (DD) is irradiatedonto a substrate (S) to perform drawing processing. A character font of a candidate character is subjected to bitmap conversion in advance and prepared as character data (CD) so that the character data (CD) is converged to a size of a divided region obtained by dividing an information region displaying exposure information by a maximum predetermined number of characters. A designated character designated as exposure information is replaced with prepared character data (CD) and synthesized into an information area.

Description

technical field [0001] The present invention relates to a drawing device and a drawing method for drawing a pattern on a printed board, semiconductor substrate, glass substrate, etc. (hereinafter, simply referred to as "substrate") on which a photoreceptor is formed by irradiating light based on drawing data. Background technique [0002] There is known an exposure device that irradiates laser light to a substrate on which a photoreceptor such as a resist is formed while scanning, thereby performing partial exposure continuously to draw a desired circuit pattern on the substrate. Since such an exposure device directly draws a circuit pattern on a substrate by irradiating laser light modulated based on the drawing data without using a mask, this exposure device is known as a direct drawing device (direct drawing device) (for example, Refer to Patent Documents 1 and 2). [0003] Patent Document 1: Japanese Patent Laid-Open No. 2010-204421 [0004] Patent Document 2: Japanese...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/2053G03F7/2055G03F7/704G03F7/70116G03F7/70991G03F7/20
Inventor 鉈落信也八坂智
Owner DAINIPPON SCREEN MTG CO LTD
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