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A large-diameter ni-v rotating target containing trace elements and its preparation method

A technology with trace elements and large tube diameter, applied in metal material coating process, vacuum evaporation coating, coating and other directions, can solve problems such as difficulty and cracking of nickel-vanadium tubes, improve utilization rate and improve grain boundary bonding force , the effect of excellent performance

Active Publication Date: 2021-04-09
NANJING DAMAI SCI&TECH IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Purpose of the invention: One of the purposes of the present invention is to provide a large-diameter Ni-V rotating target containing trace elements, which can improve the performance of the rotating target by adding trace elements C, B, Ti, and Mg; The second purpose is to provide a method for preparing a large-diameter Ni-V rotating target containing trace elements, which can overcome the problems of nickel-vanadium tube cracking, inclusions, defects, eccentricity and processing difficulties during the preparation process. Vanadium rotating target

Method used

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  • A large-diameter ni-v rotating target containing trace elements and its preparation method
  • A large-diameter ni-v rotating target containing trace elements and its preparation method
  • A large-diameter ni-v rotating target containing trace elements and its preparation method

Examples

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Embodiment 1

[0050] In this embodiment, the components and contents of the large-diameter Ni-V rotating target containing trace elements are, by mass percentage, respectively: C 0.02%, B 0.03%, Ti 0.005%, Mg 0.01%, V 6% and The balance is Ni and unavoidable impurities.

[0051] The preparation method of the large-diameter Ni-V rotating target comprises the following steps:

[0052] (1) Vacuum smelting: prepare raw materials graphite, boron particles, metal titanium, metal magnesium, metal vanadium, electrolytic nickel, wherein the purity of the raw materials is 99.9% of graphite, 99.9% of boron particles, 99.9% of metal titanium, 99.9% of Metal magnesium, 99.9% metal vanadium, 99.96% electrolytic nickel;

[0053] Clean the surface oil and oxides of electrolytic nickel and metal vanadium, dry and weigh them, then bake the electrolytic nickel at 600°C and keep it warm for 6 hours; Graphite is put into a vacuum melting crucible, electrified and smelted, the smelting temperature is 1500°C, a...

Embodiment 2

[0065] The components and contents of the large-diameter Ni-V rotating target in this embodiment are, by mass percentage, respectively: C 0.03%, B 0.01%, Ti 0.003%, Mg 0.03%, V 7% and the balance Ni and unavoidable impurities.

[0066] The preparation method of the large-diameter Ni-V rotating target in this example is basically the same as that in Example 1, except that:

[0067] In step (1), the electrolytic nickel is baked at 580°C and kept warm for 5 hours; the melting temperature is 1450°C, the melting time is 70 minutes, and the refining time is 10 minutes:

[0068] In step (3), the ingot is heated to 1090°C, and after being kept for 20 minutes, it is forged. The temperature for starting forging is 1090°C, and the temperature for final forging is 1000°C; 55%;

[0069] In step (4), the central through hole with a diameter of 20 mm is machined, and a tapered hole with a 30° taper is processed at one end thereof;

[0070] In step (5), the induction heating temperature is...

Embodiment 3

[0075] The components and contents of the large-diameter Ni-V rotating target in this embodiment are, by mass percentage, respectively: C 0.05%, B 0.08%, Ti 0.001%, Mg 0.05%, V 8% and the balance Ni and unavoidable impurities.

[0076] The preparation method of the large-diameter Ni-V rotating target in this example is basically the same as that in Example 1, except that:

[0077] In step (1), the electrolytic nickel is baked at 610°C for 8 hours; the melting temperature is 1400°C, the melting time is 90 minutes, and the refining time is 20 minutes:

[0078] In step (3), the ingot is heated to 1110° C., and after holding the heat for 40 minutes, forging is carried out. The starting forging temperature is 1110° C., and the final forging temperature is 990° C.; the deformation of the pier thickness is 65%;

[0079] In step (4), machining a diameter is a central through hole of 30mm, and machining a tapered hole into a 40° taper at one end thereof;

[0080] In step (5), the ind...

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Abstract

The invention discloses a large-diameter Ni-V rotating target material containing trace elements and a preparation method thereof. The rotating target material comprises the following components in mass percentage: C 0.01-0.05%, B 0.01-0.08%, Ti 0.001-0.006%, Mg 0.01-0.05%, V 6-8%, and the balance of Ni and unavoidable impurities. The preparation steps sequentially adopt vacuum melting, hot forging, machining, hot extrusion, pickling treatment, solution treatment, cold rolling or boring, annealing treatment, machining or binding. On the basis of Ni-V, the present invention adds trace elements C, B, Ti, and Mg to optimize the composition, reduce the content of oxygen, sulfur, etc., and can inhibit the initiation of cracks, and improve the grain boundary bonding force and strength of the target. And refine the grain, thereby increasing the yield; by optimizing the thermal processing process parameters, the scrap rate is reduced.

Description

technical field [0001] The invention relates to a magnetron sputtering target material and its preparation, in particular to a large diameter Ni-V rotating target material containing trace elements and its preparation method. Background technique [0002] With the development of science and technology, the development of coating technology is becoming more and more perfect, and the magnetron sputtering coating technology, which occupies an important position in the coating field, is also being further improved, and the target is the most critical basic consumable in the process of magnetron sputtering coating. Only high-utilization, high-quality, and most suitable targets can fully meet the demand and drive the development of science and technology. [0003] At present, the nickel-vanadium target magnetron sputtering coating technology has a relatively large market in the domestic solar energy field, but most of the nickel-vanadium targets are planar targets, and rotating ta...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C22C1/02C22C19/03C22F1/10
CPCC22C1/023C22C19/03C22F1/10C23C14/3414C23C14/35
Inventor 吴宇宁卿海标周其刚
Owner NANJING DAMAI SCI&TECH IND CO LTD
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