Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask containing tremella fuciformis and herba dendrobii extracts and preparation method of mask

A dendrobium extract and a technology for the extract are applied in the field of facial masks containing tremella and dendrobium extracts and the field of preparation thereof, which can solve the problems of complex ingredients, skin tolerance problems, active substances are not resistant to high temperature, etc., so as to improve the moisture content, The effect of increasing water content and repairing the epidermis

Inactive Publication Date: 2019-10-18
上海惠嘉化妆品有限公司
View PDF1 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At this stage, the demand for efficacy in facial masks is increasing day by day, and consumers need products that can bring clear effects, so it is necessary to add a large amount of active substances to play the role of moisturizing, whitening, anti-wrinkle, soothing, and nourishing, and active substances are large. Most of them are not resistant to high temperature and need to be added at low temperature, and the blind superposition of active substances causes skin tolerance problems. With complex ingredients, consumers often have allergies when using masks, which poses a huge challenge to the stability of the formula of the mask. challenge

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask containing tremella fuciformis and herba dendrobii extracts and preparation method of mask
  • Mask containing tremella fuciformis and herba dendrobii extracts and preparation method of mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] The present invention will be further described below in conjunction with Examples 1-3.

[0031] The invention discloses a facial mask containing white fungus and dendrobium extracts, which comprises the following components and parts by weight:

[0032] 60-80 parts of deionized water, 5-10 parts of white fungus powder, 1-3 parts of Dendrobium officinale extract, 3-5 parts of rose water, 1.0-5.0 parts of glycerin, 1-3 parts of butylene glycol, 0.2 parts of phenoxyethanol ~0.3 parts, Chlorphenesin 0.06~0.08 parts, Methylparaben 0.1~0.15 parts, Xanthan gum 0.1~0.2 parts, Sodium hyaluronate 0.01~0.05 parts, Scutellaria baicalensis root extract 0.05~0.2 parts, Sophora flavescens 0.05-0.2 parts of root extract, 0.05-0.2 parts of licorice root extract, 0.05-0.2 parts of angelica root extract, 0.05-0.2 parts of Panax notoginseng root extract, 0.05-0.2 parts of plum fruit extract, ginkgo leaf extract 0.05-0.2 parts of substances, 0.05-0.2 parts of arginine / lysine polypeptides....

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Finenessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a mask containing tremella fuciformis and herba dendrobii extracts and a preparation method of the mask. The mask is prepared from, by weight, deionized water, tremella fuciformis powder, the herba dendrobii extract, rose flower water, glycerin, butanediol, phenoxyethanol, chlorphenesin, methylparaben, xanthan gum, sodium hyaluronate, a radix scutellariae extract, a radix sophorae extract, a glycyrrhiza inflata root extract, a radix angelicae sinensis extract, a radix pseudo-ginseng extract, a plum extract, a ginkgo leaf extract and arginine / lysine polypeptide. According to the mask, the tremella fuciformis extract and the herba dendrobii extract which have extremely high polysaccharide content are selected, other skin-sensing modifiers and other complex skin-sensing conditioners are not added, the components are simple, and the mask is natural and smooth and has super-strong moisturizing and repairing effects.

Description

technical field [0001] The invention specifically relates to a mask containing white fungus and dendrobium extracts and a preparation method thereof. Background technique [0002] Masks are a category within skin care products. Its most basic and most important purpose is to make up for the lack of cleansing work of makeup remover and face wash, and on this basis, cooperate with other essence ingredients to achieve other maintenance functions, such as moisturizing, whitening, anti-aging, balancing oil and so on. Mask is a kind of carrier of beauty care products. At present, powder blending, kaolin, non-woven fabric, silk mask, bio-cellulose mask, and non-woven mask materials are widely used. The sheet mask is the most used and favorite form of mask by consumers. The principle of the patch mask is to use the short time covered on the face to temporarily isolate the outside air and pollution, increase the temperature of the skin, expand the pores of the skin, promote the sec...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61K8/34A61K8/64A61K8/73A61K8/9728A61K8/9771A61K8/9789A61K8/9794A61Q19/00A61Q19/02
CPCA61K8/9728A61K8/9794A61K8/9789A61K8/345A61K8/73A61K8/735A61K8/9771A61K8/64A61Q19/00A61Q19/02
Inventor 虞林忠黄华
Owner 上海惠嘉化妆品有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products