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Method for separating deposition film layer from accessory in vacuum coating cavity

A technology of vacuum coating and deposition film, applied in coating, gaseous chemical coating, metal material coating process, etc., can solve the problems of equipment operation failure and difficult to clean up the spray material thoroughly, so as to improve the yield and reduce labor. The trouble of cleaning, the effect of wide applicability

Inactive Publication Date: 2019-10-11
江苏华恒新能源有限公司
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Problems solved by technology

Although the sandblasting equipment can quickly and cleanly clean the silicon nitride attached to the surface, it is difficult to clean up the spray material splashed everywhere, and it may cause equipment failure in the future

Method used

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  • Method for separating deposition film layer from accessory in vacuum coating cavity
  • Method for separating deposition film layer from accessory in vacuum coating cavity

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Embodiment 1

[0024] Example 1: see figure 1, a method for separating and depositing a film layer from accessories in a vacuum coating chamber. The method is as follows. In battery production, the plate PECVD coating is used as an example. The plate PECVD uses a vacuum coating principle. During the coating process, the silicon nitride deposition film left by the process will adhere to the surface of the cavity. Silicon nitride is an important structural ceramic material. It is a superhard substance that is inherently lubricious and wear-resistant, which makes it difficult to remove silicon nitride deposits during equipment maintenance. The silicon nitride deposition layer can be quickly and cleanly removed by using the technology of separating the deposited film layer from the fittings in the vacuum coating chamber. After raising the temperature of the chamber to 400°C-450°C, feed the liquid nitrogen coolant until the temperature drops to 50°C and then stop the feed. The cooling process i...

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Abstract

The invention relates to a method for separating a deposition film layer from an accessory in a vacuum coating cavity. The method comprises the following steps that the temperature of the cavity is increased to 400-450 DEG C, liquid nitrogen cooling substance is introduced into the cavity till the temperature is suddenly reduced to 50 DEG C, the cooling process is limited within 1 min, and introducing and closing of nitrogen are controlled through a temperature control system. The technical scheme is used for separating the deposition film layer from the accessory in the vacuum coating cavity,the deposition film layer is rapidly separated, and the method can be widely applied to various kinds of vacuum coating equipment using CVD or PVD.

Description

technical field [0001] The invention relates to a method, in particular to a method for separating and depositing film layers from fittings in a vacuum coating cavity, and belongs to the field of material application. Background technique [0002] With the rapid development of modern industrial production, various new thin film materials emerge in an endless stream, and CVD and PVD technologies are increasingly widely used. PVD is Physical Vapor Deposition, which is an advanced surface treatment technology widely used at present; its working principle is to use gas discharge to separate the gas or evaporated material under vacuum conditions, and to separate the gas or evaporated material under the bombardment of gas ions or evaporated material ions. Simultaneously, the evaporant or its reactant is deposited on the substrate. CVD (Chemical VaporDeposition, chemical vapor deposition) is the process of introducing the gaseous reactant or liquid reactant vapor containing the fi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/34C23C16/44C23C16/50
CPCC23C16/345C23C16/4404C23C16/50
Inventor 皇韶峰朱豪杰
Owner 江苏华恒新能源有限公司
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