Pneumatic and stable semiconductor wafer cutting device based on the principle of magnetic pole boosting

A cutting device and semiconductor technology, applied in the semiconductor field, can solve problems such as wash-off and wafer integrity limitation, and achieve the effect of increasing sliding property

Active Publication Date: 2021-04-09
浙江积成星科技有限公司
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The current technology separates the chip raw material on the silicon crystal board from the board body through horizontal cutting, so as to carry out extraction. Since the cooling liquid is generally used to directly cool the cutting point to achieve the cooling of the cutting sheet, the chip raw material after cutting is Coolant flushed away, wafer integrity after dicing is limited and needs to be optimized

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Pneumatic and stable semiconductor wafer cutting device based on the principle of magnetic pole boosting
  • Pneumatic and stable semiconductor wafer cutting device based on the principle of magnetic pole boosting
  • Pneumatic and stable semiconductor wafer cutting device based on the principle of magnetic pole boosting

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0030] see Figure 1-Figure 7 , the present invention provides an aerodynamically stable semiconductor wafer cutting device based on the principle of magnetic pole boosting. The turntable 5 is installed on the middle part of the surface of the fixed base 4 by buckling, the top and rear end of the fixed base 4 is provided with a gantry guide frame 3, and the bottom of the mobile platform 2 is installed on the upper end of the gantry guide frame 3 by a buckling mode, and the observation The rear end of the shaft seat 1 is fitted with the front end of the mobile platform 2, and the cutter 6 is mounted on the bottom of the observation shaft seat 1 by a buckle, and the cutting work of the cutter 6 can be enlarged and observed by observing the shaft seat 1. The processing turntable 5 is used to place processed wafer plates.

[0031] The cutter 6 includes a gravitational cooler 601, a driving arm 602, and a cutting piece 603. The front end of the driving arm 602 is provided with a c...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a pneumatic and stable semiconductor wafer cutting device based on the principle of magnetic pole pressurization. In the middle of the surface of the base, the top and rear ends of the fixed base are provided with a gantry guide frame, and the bottom of the mobile platform is installed on the upper end of the gantry guide frame by means of snapping. The cutter of the present invention ensures the angle of the gravity cooler through the weight box, and the gas is pressurized and output by the rotary pressure plate, and the bottom of the cutting piece is aerated, so as to solve the problem that the chip raw material is cooled during the cutting process. The problem of water peeling, and the water cooling head is designed to be cooled on both sides, which effectively avoids the situation that the chip raw material is washed away by the cooling liquid, and improves the integrity of the wafer after cutting.

Description

technical field [0001] The invention relates to the field of semiconductors, in particular to an aerodynamically stable semiconductor wafer cutting device based on the principle of magnetic pole boosting. Background technique [0002] Wafer refers to the silicon wafer used in the production of silicon semiconductor integrated circuits. Because of its round shape, it is called wafer. Wafer is the basic material for manufacturing semiconductor chips. During manufacture, silicon crystals are obtained through a long process of growing After cutting, rolling, slicing, chamfering, polishing, and laser engraving, the silicon wafer and the board are separated to become the chip raw material of the integrated circuit factory. There are such problems in the use of existing wafer cutting devices on the market: [0003] The current technology separates the chip raw material on the silicon crystal board from the board body through horizontal cutting, so as to carry out extraction. Since...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): B28D5/02B28D7/00B28D7/02H01L21/304
CPCB28D5/0058B28D5/0076B28D5/023H01L21/304
Inventor 刘燕枝黄荣章骆卫钦陈秀珍
Owner 浙江积成星科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products