Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Wafer box rotating mechanism and loading chamber

A technology of rotating mechanism and loading cavity, applied in the directions of transportation and packaging, conveyor objects, electrical components, etc., can solve the problems of unergonomic operation, inability to return the cassette, and large opening width of the cavity, etc. The effect of improving the production yield of the process, improving the yield of the chip, and saving the time of taking the chip

Active Publication Date: 2019-07-02
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] But in the chip box rotating mechanism of above-mentioned structure, at first, because the kind of wafer is different, coefficient of friction is different, under the situation that inclination angle is not enough when tilting, wafer may not be able to slide to the notch of chip box rear portion, and tilts The angle is limited by the center of gravity of the mechanism and cannot exceed the center of rotation, otherwise the film cassette cannot be returned when it is poured out
Secondly, the entire loading action requires the operator to put the cassette into the chamber, which requires a wide opening of the chamber, and the operation action is not ergonomic, which may easily cause mistakes and cause the wafer to slip out

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Wafer box rotating mechanism and loading chamber
  • Wafer box rotating mechanism and loading chamber
  • Wafer box rotating mechanism and loading chamber

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0074] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

[0075] Such as Figure 6 to Figure 11 As shown, the first aspect of the present invention relates to a cassette rotating mechanism 100 . Wherein, the cassette rotating mechanism 100 includes a supporting base 110 , a rotating supporting base 120 and a moving assembly 130 .

[0076] The support base 110 mentioned above can move linearly in the vertical direction under the action of the driving force. For example, the support base 110 can be connected with the lifting assembly 220 described below, which provides the driving force for the support base 110 . That is to say, driven by the lifting assembly 220 , the support base 110 can move linearly in the vertical...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a wafer box rotating mechanism and a loading chamber. The wafer box rotating mechanism comprises a supporting base, a rotating support seat and a moving assembly. The supporting base can move linearly in the vertical direction under the action of a driving force. The rotating support seat is located on the supporting base, and one end of the rotating support seat is rotationally connected with one end of the supporting base. The rotating support seat is used for loading a wafer box. The moving assembly comprises a guide rail, a moving part and an elastic part. The moving part is connected to the side of the rotating support seat. The guide rail is fixedly arranged on the side wall of a loading chamber. During downward movement of the supporting base, the guide railcan contact the moving part and prevent the moving part from moving downward, so that the rotating support seat rotates from a vertical position to a horizontal inverted position. The elastic part isused for exerting a restoring force on the rotating support base so that the rotating support base rotates from the horizontal inverted position to the vertical position. A wafer can be accurately located in a wafer box, the yield of wafer taking can be improved, and the time for wafer taking can be saved.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment, in particular to a chip box rotating mechanism and a loading chamber comprising the chip box rotating mechanism. Background technique [0002] In the traditional semiconductor equipment transmission system, such as figure 1 As shown, the transmission system includes a loading chamber 200 , a transmission chamber 300 and a process chamber 400 , wherein the loading chamber 200 is provided with a cassette 210 and a lifting assembly 220 , and the transmission chamber 300 is provided with a manipulator 310 . Specifically, the lifting assembly 220 drives the cassette 210 to move linearly along the vertical direction, so as to facilitate the manipulator 310 in the transfer chamber 300 to take out wafers from the cassette 210 . Among them, taking out wafers from the cassette 210 is the first step in the automatic transfer process of many semiconductor devices, so the efficiency and relia...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/677
CPCH01L21/67775H01L21/67778
Inventor 李冬冬赵梦欣赵磊李萌
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products