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Reduction furnace chassis device variable in feeding flow velocity

A reduction furnace and chassis technology, applied in the direction of inorganic chemistry, non-metallic elements, silicon compounds, etc., can solve the problem that the reduction furnace is inconvenient to adjust the feeding speed, etc., and achieve the effect of simple structure, conducive to popularization and application, and flexible and convenient operation

Active Publication Date: 2019-03-01
ASIA SILICON QINGHAI
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  • Abstract
  • Description
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Problems solved by technology

[0004] In order to solve the above technical problems, a technical solution adopted by the present invention is to provide a reduction furnace chassis device with variable feed flow rate, which solves the technical problem that the reduction furnace is inconvenient to adjust the feed rate

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  • Reduction furnace chassis device variable in feeding flow velocity
  • Reduction furnace chassis device variable in feeding flow velocity

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Embodiment Construction

[0020] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings. Apparently, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0021] like figure 1 , figure 2 As shown, a reduction furnace chassis device with variable feed flow rate includes a furnace body 1 and a chassis 2; it is characterized in that: the lower end of the chassis 2 is connected with a plurality of feed pipes 3 communicating with the furnace body 1; One end of the feed pipe 3 towards the chassis 2 is a spray port 4, and the inner hole of the spray port 4 is tapered; a slide bar 5 is slidably arr...

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Abstract

The invention relates to a reduction furnace chassis device variable in feeding flow velocity and belongs to the technical field of reduction furnaces. The reduction furnace chassis device comprises afurnace body and a chassis and is characterized in that the lower end of the chassis is connected with multiple feeding pipes communicated with the furnace body, the ends, facing the chassis, of thefeeding pipes are jet ports, the inner holes of the jet ports are conical, sliding rods are slidingly arranged in the feeding pipes, a baffle is fixed to one end of each sliding rod, the other end ofeach sliding rod penetrates out of the corresponding feeding pipe to be connected with an extensible mechanism, and the baffles are arranged close to the jet ports. The reduction furnace chassis device has the advantages that under the condition that the flow in each feeding pipe is invariable, the smaller a material channel is, the higher the flow velocity of the material passing through the material channel is, the higher the velocity of the jet material is, the feeding flow velocity is adjusted by adjusting the positions of the baffles, and the reduction furnace chassis device is flexible and convenient to operate, simple in structure and worthy of popularization and application.

Description

technical field [0001] The invention relates to the technical field of reduction furnaces, in particular to a reduction furnace chassis device with variable feed flow rate. Background technique [0002] At present, polysilicon production enterprises at home and abroad mainly adopt the "improved Siemens method". The production process is to use chlorine and hydrogen to synthesize hydrogen chloride (or purchased hydrogen chloride), hydrogen chloride and silicon powder to synthesize trichlorosilane at a certain temperature, and then purify trichlorohydrogen After silicon and hydrogen are mixed in a certain proportion, they enter the furnace body from the feed pipe on the chassis of the reduction furnace under a certain temperature and pressure, and deposit polysilicon cores on the high-temperature silicon cores that are energized, and the reaction tail gas passes through the gas outlet on the chassis. discharge. The polysilicon reduction furnace is a key reactor for polysilico...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/035
CPCC01B33/035
Inventor 闫晓英韩成福高志明甘易武郑连基姜兴王天应
Owner ASIA SILICON QINGHAI
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