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Graphite phase carbon nitride foam photocatalytic material and preparation method thereof

A technology of graphitic carbon nitride and photocatalytic materials, applied in the field of photocatalytic materials, can solve the problems of difficult reaction medium and rapid transmission, and achieve the effects of low cost, promotion of transmission, and high photocatalytic hydrogen production efficiency

Active Publication Date: 2019-01-25
WUHAN UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The published reports include: "Preparation of mesoporous C by molten salt method 3 N 4 Photocatalytic materials and their application in the field of photocatalysis" (CN102992282B) patent technology and "a carbon nitride g-C based on graphite phase 3 N 4 Photocatalyst and its preparation method and application” (CN201710236277.8) patented technology, the above-mentioned patented technology mainly uses molten salt synthesis technology and physical and chemical treatment methods to prepare powdery C with high specific surface area 3 N 4 Photocatalytic materials, but there is also the problem that the reaction medium is difficult to transport quickly in the system

Method used

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  • Graphite phase carbon nitride foam photocatalytic material and preparation method thereof
  • Graphite phase carbon nitride foam photocatalytic material and preparation method thereof
  • Graphite phase carbon nitride foam photocatalytic material and preparation method thereof

Examples

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Effect test

Embodiment 1

[0026] A graphite phase carbon nitride foam photocatalytic material and a preparation method thereof. The preparation method described in this embodiment is:

[0027] Step 1: Add 5 to 8 parts by mass of graphite phase carbon nitride to 100 parts by mass of deionized water, mix uniformly to obtain a suspension; then add 1.7 to 1.8 parts by mass of twelve to the suspension Sodium alkyl sulfonate, 1.7-1.8 parts by mass of dodecanol and 1.7-1.8 parts by mass of resin glue are stirred at 40-56° C. and 100-200 r / min for 10-16 minutes to obtain a mixed solution.

[0028] Step 2. Under the condition of rotating speed of 1500~2000r / min, stir the mixture for 15~18min, then add 5~8 parts by mass of binding agent to the mixture under stirring, continue to stir for 5~8min to obtain graphite phase Carbon nitride foam slurry.

[0029] Step 3: Pouring the graphite phase carbon nitride foam slurry into a shape, freeze-drying for 6-8 hours, and then drying at 80-90°C for 18-20 hours to obtain a grap...

Embodiment 2

[0032] A graphite phase carbon nitride foam photocatalytic material and a preparation method thereof. The preparation method described in this embodiment is:

[0033] Step 1. Add 8 to 11 parts by mass of graphite phase carbon nitride to 100 parts by mass of deionized water, mix uniformly to obtain a suspension; then add 1.8 to 1.9 parts by mass of twelve to the suspension Sodium alkyl sulfonate, 1.8-1.9 parts by mass of dodecanol and 1.8-1.9 parts by mass of resin glue are stirred at 42-58°C and 100-200 r / min for 12-18 minutes to obtain a mixed solution.

[0034] Step 2. Under the condition of rotating speed of 1500~2000r / min, stir the mixture for 16~19min, then add 8~11 mass parts of binding agent to the mixture under stirring, continue to stir for 6~9min to obtain graphite phase Carbon nitride foam slurry.

[0035] Step 3: Pouring the graphite phase carbon nitride foam slurry into a shape, freeze-drying for 8-10 hours, and then drying at 80-90°C for 20-22 hours to obtain a graphi...

Embodiment 3

[0038] A graphite phase carbon nitride foam photocatalytic material and a preparation method thereof. The preparation method described in this embodiment is:

[0039] Step 1. Add 11-14 parts by mass of graphite phase carbon nitride to 100 parts by mass of deionized water, mix uniformly to obtain a suspension; then add 1.9-2.0 parts by mass of twelve to the suspension Sodium alkyl sulfonate, 1.9-2.0 parts by mass of dodecanol, and 1.9-2.0 parts by mass of resin glue are stirred at 44-60° C. and 100-200 r / min for 14-20 minutes to obtain a mixed solution.

[0040] Step 2. Under the condition of rotating speed of 1500~2000r / min, stir the mixture for 17~20min, then add 11~14 parts by mass of binding agent to the mixture under stirring and continue to stir for 7~10min to obtain graphite phase Carbon nitride foam slurry.

[0041] Step 3: Pouring the graphite phase carbon nitride foam slurry into a shape, freeze-drying for 10-12 hours, and then drying at 80-90°C for 22-24 hours to obtain a...

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Abstract

The invention relates to a graphite phase carbon nitride foam photocatalytic material and a preparation method thereof. The preparation method includes adding 5-14 parts by mass of graphite phase carbon nitride to 100 parts by mass of deionized water, mixing, further adding 1.7-2.0 parts by mass of sodium dodecyl sulfate, 1.7-2.0 parts by mass of dodecyl alcohol and 1.7-2.0 parts by mass of resingum and stirring at 40-60 DEG C and 100-200 r / min for 10-20 minutes to obtain a mixed solution; stirring the mixed solution at 1500-2000 r / min for 15-20 min, then adding 5-14 parts by mass of binder and continuing stirring for 5-10 min to obtain graphite phase carbon nitride foam slurry; molding the graphite phase carbon nitride foam slurry by casting, freeze drying for 6-12 hours, and drying at 80-100 DEG C for 18-24 hours to obtain the graphite phase carbon nitride foam photocatalytic material. The preparation method has simple process and low cost. The prepared graphite phase carbon nitridefoam photocatalytic material has high photocatalytic hydrogen production efficiency.

Description

Technical field [0001] The invention belongs to the technical field of photocatalytic materials. Specifically, it relates to a graphite phase carbon nitride foam photocatalytic material and a preparation method thereof. Background technique [0002] Photocatalytic technology is the process of using photocatalytic materials to convert solar energy into chemical energy. It is based on the photoelectric conversion mechanism of photocatalytic semiconductors. After absorbing sunlight, electrons in the valence band are excited to transition to the conduction band, generating electrons and holes , Forming a redox barrier to achieve hydrogen production and CO reduction 2 And the purpose of degrading organic matter. As the core working component of the photocatalytic system, photocatalytic materials, whose structure and performance directly determine the efficiency of the photocatalytic reaction. The earliest photocatalytic material used is Ti 2 O, ZnO and SnO 2 Other metal oxide semico...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J27/24B01J35/10B01J35/04C01B3/04
CPCC01B3/042B01J27/24B01J35/56B01J35/657B01J35/39Y02E60/36
Inventor 赵雷孙志敏方伟李薇馨陈辉何漩黄朝晖
Owner WUHAN UNIV OF SCI & TECH
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