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Polishing solution for glass and preparation method of polishing solution

A technology of polishing liquid and glass, which is applied in the field of polishing liquid, and can solve the problems of limited popularization and application, increased contact area, and poor guarantee of uniform dispersion and compounding effect, etc.

Active Publication Date: 2019-01-04
LENS TECH CHANGSHA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the contact area between cerium oxide and silicon oxide particles in the polishing liquid produced at the same time is greatly increased, and the uniform dispersion and compounding effect of the product cannot be well guaranteed in use. In addition, the polishing liquid will appear under long-term storage. Self-separation phenomenon, particle agglomeration and agglomeration are prone to occur under the action of the external environment
This limits its promotion and application in process production

Method used

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  • Polishing solution for glass and preparation method of polishing solution
  • Polishing solution for glass and preparation method of polishing solution
  • Polishing solution for glass and preparation method of polishing solution

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preparation example Construction

[0043] The present invention also provides a method for preparing the above polishing liquid for glass, comprising: S1) mixing water, aluminum oxide and cerium oxide to obtain a first mixture; S2) mixing the first mixture, a dispersant and a grinding aid, Obtaining a third mixture; S3) mixing the third mixture with a pH regulator to obtain a glass polishing solution.

[0044] According to the present invention, it is preferred to mix water and surfactant first; the surfactant is the same as described above, so it will not be repeated here; the method of mixing is a method well known to those skilled in the art, and there is no special limitation , In the present invention, it is preferred to mix by stirring; the rotational speed of the stirring is preferably 300-700 rpm.

[0045] After mixing evenly, add aluminum oxide and cerium oxide and mix to obtain the first mixture; the aluminum oxide and cerium oxide are the same as above, and will not be repeated here; the mixing metho...

Embodiment 1～5、 comparative example 1～12

[0052] Add each substance according to the amount of raw materials shown in Table 1:

[0053] Preparation Process:

[0054] a) Add deionized water into a container with a certain capacity, add surfactant, and keep stirring at 300-700rpm until uniformly dispersed;

[0055] b) Then slowly add cerium oxide and alumina powder, stop stirring after stirring for 1 hour, and let the solution stand for 5 hours;

[0056] c) Turn on the stirring, add dispersant, leveling agent, preservative and grinding aid respectively, and stir until evenly dispersed;

[0057] d) adding a pH adjuster and stirring until uniformly dispersed to obtain a glass polishing solution.

[0058] Table 1 embodiment 1~5 and comparative example 1~13 raw material consumption

[0059]

[0060]

[0061]

[0062]

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Abstract

The invention provides a polishing solution for glass. The polishing solution is prepared from 8 to 30 parts by weight of aluminum oxide, 9 to 32 parts by weight of cerium oxide, 5 to 8 parts by weight of dispersing agent, 1 to 5 parts by weight of grinding aid, 0.01 to 1 part by weight of pH modifier and proper amount of water. The water enables the total amount of the polishing solution to be 100 weight parts. The particle size of the aluminum oxide is 100 to 500 nm and the particle size of the cerium oxide is 600 to 1200 nm. Compared with the prior art, the polishing solution disclosed by the invention has the advantages that the cerium oxide and the aluminum oxide are compounded to serve as an abrasive; the aluminum oxide can effectively improve the polishing rate; the cerium oxide canreduce the surface roughness of machining parts and improve the strength of the glass; meanwhile, elements such as F and O in the dispersing agent can be complexed with metal ions in abrasive particles, so that the suspension property of the polishing solution is improved; by combined action of all the components, the polishing solution has better polishing efficiency as well as better suspensiondispersion and high stability; the polished product has the advantages of high strength, low roughness and higher apparent yield.

Description

technical field [0001] The invention belongs to the technical field of polishing fluid, in particular to a polishing fluid for glass and a preparation method thereof. Background technique [0002] With the development of modern technology, in the production of resin polishing abrasives, especially the requirements for high-precision grinding and mirror polishing, as well as the wide application of fine-grained abrasives, this also puts forward higher and higher requirements for ultra-fine powder. Require. It is required that the ultrafine powder should not only meet the requirements of extremely fine powder particles, but also have a narrow distribution. At the same time, the performance of the ultrafine powder must have good dispersibility and be mixed with other materials, and it must have good compatibility when used. [0003] Cerium oxide (CeO 2 ) Nano particle polishing liquid is a high-quality polishing material, which is often used in the polishing of aviation glass...

Claims

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Application Information

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IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 周群飞陆继果
Owner LENS TECH CHANGSHA
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