SPR nerve synaptic device based on a-Si memristor effect and preparation method thereof
A technology of neural synapse and memristor, which is applied in the field of bionic devices, can solve the problems of small signal processing bandwidth and signal transmission crosstalk, and achieve the effect of large signal processing bandwidth, large bandwidth, and avoiding grazing incidence
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Embodiment 1
[0035] A SPR neurosynaptic device based on a-Si memristive effect, its structure is as follows figure 1 Shown: include a memristor and a crystalline silicon prism 6 arranged above the memristor. In this embodiment, the crystalline silicon prism 6 is a triangular prism processed from crystalline silicon. The memristor has "Bottom electrode 1 / first a-Si resistive layer 2 / second a-Si resistive layer 3 / top electrode 4" vertical four-layer structure, in this embodiment the top electrode 4 is deposited on the bottom surface of the crystalline silicon prism 6 Metal silver Ag, the second a-Si resistive layer 3 is an a-Si thin film containing Ag nanoparticles, the volume fraction of Ag nanoparticles is 40%, and the first a-Si resistive layer 2 is an a-Si film containing Ag nanoparticles a-Si film, the volume fraction of Ag nanoparticles is 5%, the top electrode 4 is metal platinum Pt deposited on the bottom surface of the first a-Si resistive layer 2; the refractive index of the crysta...
Embodiment 2
[0044] A SPR neurosynaptic device based on a-Si memristive effect, its structure is as follows figure 1 Shown: comprise memristor and be arranged on the crystalline silicon wafer 5 above described memristor and be arranged on the crystalline silicon prism 6 above described crystalline silicon wafer 5, in the present embodiment, crystalline silicon prism 6 is processed by crystalline silicon The formed triangular prism, the crystalline silicon wafer 5 is also processed from crystalline silicon, and the crystalline silicon wafer 5 and the crystalline silicon prism 6 are preferably bonded with a refractive index matching liquid, and the memristor has a bottom-to-top Electrode 1 / first a-Si resistive layer 2 / second a-Si resistive layer 3 / top electrode 4" vertical four-layer structure, top electrode 4 in this embodiment is deposited on the bottom surface of crystalline silicon prism 6 Metal silver Ag, the second a-Si resistive switch layer 3 is an a-Si thin film containing Ag nanopa...
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