Concentration management device of development liquid and development processing system of base plate

A technology of management device and processing system, applied in photography, photoengraving process of pattern surface, optics, etc., can solve problems such as difficulty in earning profits, and achieve the effect of high-precision concentration management

Pending Publication Date: 2018-12-07
HIRAMA LAB
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, there is another problem that it is difficult for device sellers to earn sufficient profits unless they repeatedly find substrate manufacturers who wish to purchase devices in a limited market and sell the devices.

Method used

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  • Concentration management device of development liquid and development processing system of base plate
  • Concentration management device of development liquid and development processing system of base plate
  • Concentration management device of development liquid and development processing system of base plate

Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach 〕

[0108] figure 1 It is a schematic diagram for demonstrating the development processing system of the board|substrate equipped with the concentration management apparatus A of the developer of this embodiment.

[0109] During the development process, the developing solution dissolves unnecessary portions of the photoresist film after the exposure treatment, thereby performing development. A photoresist salt is generated between the photoresist dissolved in the developer and the alkali component of the developer. Therefore, if the developing solution is not properly managed, as the development process progresses, the alkali component having development activity in the developing solution is consumed and deteriorates, and the developing performance deteriorates. At the same time, the photoresist dissolved in the developer reacts with the alkali component and accumulates in the form of photoresist salt.

[0110] The photoresist dissolved in the developer exhibits interfacial act...

no. 2 approach 〕

[0176] figure 2 It is a schematic diagram for explaining the development processing system of the board|substrate. The development processing system for this substrate includes: the developer concentration management device A, the development processing device B, and the preparation device E according to this embodiment; B: A pipe 83 for supplying pure water; a pipe 84 for new liquid that supplies a new liquid of the developer prepared by the preparation device E to the developing processing device B; and a control valve 41 arranged in these pipes and controlled by the concentration management device A , 43, 44 and cumulative flow meters 151, 153, 154.

[0177] exist figure 2 In the above, the new liquid of the developer supplied as the replenisher is automatically prepared and supplied by the preparation device E using the original liquid of the developer and pure water as its raw materials. The preparation device E is connected to the development processing device B via...

no. 3 approach 〕

[0193] image 3 It is a schematic diagram for explaining the development processing system of the board|substrate provided with the density management apparatus A of a developer, the development processing apparatus B, the regeneration apparatus F, and the integrated flow meter 151, 152, 153, 155 of this embodiment.

[0194] exist image 3 In , the developer used in the development processing device B is regenerated by the regenerating device F so that it can be reused. The regenerating liquid regenerated by the regenerating device F is supplied to the developing processing device B as one of replenishing liquids. The regeneration device F is connected to the development processing device B through a regeneration liquid pipe 85 . The piping 85 for regeneration liquid is provided with the control valve 45 and the integrated flow meter 155 .

[0195] in addition, image 3 The developing solution concentration management device A is in a form including control valves 41 , 42 ...

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Abstract

The invention provides a concentration management device of development liquid which can manage development liquid used for developing of a base plate to be in the optimal state and a development processing system of a base plate. In a base plate processing system, the concentration management device (B) of development liquid, a development processing device (A), a preparing device (E) preparing new liquid of development liquid, and a regenerator (F) used for generating the development liquid being used are connected via a pipe. The concentration management device (B) of development liquid measures the physical property or the component concentration of development liquid of the development processing device (A) and supplies stoste or new liquid or regenerated liquid of development liquid,thus making the development liquid be in the optimal concentration. The supplied complementary liquid is measured by an accumulative flow meter (151, 152, 153, 154, 155) arranged on the pipe. Expenses of concentration management of development liquid or development processing expenses of base plates can be calculated based on the accumulative flow of the complementary liquid measured by the accumulative flow meter (151, 152, 153, 154, 155).

Description

technical field [0001] The present invention relates to a developer solution concentration management device and a substrate development treatment system, and in particular to a development process for developing an alkali that is repeatedly used to develop a photoresist film in a development process of a circuit board in a semiconductor or a liquid crystal panel. Liquid concentration management device and substrate development processing system. Background technique [0002] In the development process of photolithography for realizing fine wiring processing of semiconductors, liquid crystal panels, etc., as a chemical solution for dissolving the photoresist film formed on the substrate, a developing solution that exhibits alkalinity (hereinafter Also known as "alkaline developer"). Alkaline developer is maintained and used at a prescribed concentration as needed so that its performance can be maximized. The concentration management of the developer is performed by monitor...

Claims

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Application Information

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IPC IPC(8): G03F7/30
CPCG03F7/30G03F7/70483G03F7/32G03F7/0025G03F7/3071H01L21/027
Inventor 中川俊元
Owner HIRAMA LAB
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