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Near-infrared narrow-band filter piece and infrared imaging system

A narrow-band filter, near-infrared technology, applied in the direction of filters, optics, optical components, etc., can solve the problems of poor imaging effect of near-infrared filters, and reduce the total thickness of the film layer, the total coating time, and hardness. High and good wear resistance

Pending Publication Date: 2018-11-23
XINYANG SUNNY OPTICAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a near-infrared narrow-band filter and an infrared imaging system to solve the problem of poor imaging effect of the near-infrared filter

Method used

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  • Near-infrared narrow-band filter piece and infrared imaging system
  • Near-infrared narrow-band filter piece and infrared imaging system
  • Near-infrared narrow-band filter piece and infrared imaging system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0073] The first high-refractive-index film layer 121 and the first low-refractive-index film layer 122 are alternately plated to form an IR film system of a near-infrared narrow-band filter. In this embodiment, the first high refractive index film layer 121 is made of hydrogenated silicon (Si:H) material, and the first low refractive index film layer 122 is made of silicon nitride (i.e. SiN) material. m The form is arranged alternately to form the filter IR band-pass film system; wherein, L represents the height of the first low refractive index film layer 122 with a reference wavelength thickness of 1 / 4, and H represents the first high refractive index film layer 121 with a reference wavelength of 1 / 4 The height of the wavelength thickness, m represents the number of alternate plating.

[0074] In this embodiment, within the range where the incident angle changes from 0° to 10°, the central wavelength shift range of the passband band is between 0.5nm and 1.5nm, and every tim...

Embodiment 2

[0088] The first high-refractive-index film layer 121 and the first low-refractive-index film layer 122 are alternately plated to form an IR film system of a near-infrared narrow-band filter. In this embodiment, the first high refractive index film layer 121 is made of hydrogenated silicon (Si:H), and the first low refractive index film layer 122 is made of silicon nitride (i.e., Si:H). 3 N 4 ) material to L(HL) m The form is arranged alternately to form the filter IR band-pass film system; wherein, L represents the height of the first low refractive index film layer 122 with a reference wavelength thickness of 1 / 4, and H represents the first high refractive index film layer 121 with a reference wavelength of 1 / 4 The height of the wavelength thickness, m represents the number of alternate plating.

[0089] In this embodiment, within the range where the incident angle changes from 0° to 10°, the central wavelength shift range of the passband band is between 0.5nm and 1.5nm, a...

Embodiment 3

[0103] The first high-refractive-index film layer 121 and the first low-refractive-index film layer 122 are alternately plated to form an IR film system of a near-infrared narrow-band filter. In this embodiment, the first high refractive index film layer 121 is made of hydrogenated silicon (Si:H) material, and the first low refractive index film layer 122 is made of mixed materials, such as silicon nitride (SiN) and silicon dioxide (SiO 2 ) hybrid material, or silicon nitride (i.e. SiN and Si 3 N 4 ) mixed material, in L(HL) m The form is arranged alternately to form the filter IR band-pass film system; wherein, L represents the height of the first low refractive index film layer 122 with a reference wavelength thickness of 1 / 4, and H represents the first high refractive index film layer 121 with a reference wavelength of 1 / 4 The height of the wavelength thickness, m represents the number of alternate plating.

[0104] In this embodiment, within the range where the incident...

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Abstract

The invention relates to a near-infrared narrow-band filter piece and an infrared imaging system. The near-infrared narrow-band filter piece comprises a substrate and an IR film system arranged at oneside of the substrate. The IR film system consists of first high-refractive-index film layers and first low-refractive-index film layers that are plated alternately; and the first low-refractive-index film layer is arranged at the outermost layer of the IR film system. The IR film system has one passband band, two transition bands, and two cutoff bands in a wavelength range of from 800 to 1200 nm; the passband band is arranged between the two cutoff bands; and the transition bands are arranged between the passband band and the cutoff bands. The passband band has a central wavelength; and thedrift amplitude of the central wavelength of the passband band is between 7 nm and 13 nm within an incident angle changing range of from 0 degree to 30 degrees. Therefore, on the premise that the hightransmittance is guaranteed, the drift of the central wavelength of the passband of the narrow-band filter piece is reduced with the angle and the imaging quality is improved.

Description

technical field [0001] The invention relates to an optical filter and an infrared imaging system, in particular to a near-infrared narrow-band optical filter and an infrared imaging system. Background technique [0002] With the development of science and technology, face devices, gesture recognition, etc. Features. [0003] Near-infrared narrow-band filters are required for face recognition and gesture recognition, which can enhance the near-infrared light in the copper strip and cut off the visible light in the environment. Usually near-infrared narrow-band filters include two film systems, namely IR band-pass film system and long-wave pass AR film system. However, the optical filter in the prior art has poor anti-reflection effect on near-infrared light and visible light cut-off effect, and there is a problem that the thickness of the film system is relatively thick, which leads to the assembly of the optical filter in face recognition, gesture recognition, etc. After ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/20G02B1/10G02B1/115
CPCG02B1/10G02B1/115G02B5/208
Inventor 陈策丁维红肖念恭陈吉利
Owner XINYANG SUNNY OPTICAL CO LTD
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