Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of tribute silk cotton cleaning and flattening device

A technology of tribute silk cotton and tribute silk, which is applied in the direction of processing textile material equipment configuration, spraying/jetting textile material treatment, liquid/gas/vapor removal, etc., which can solve the waste of water resources, complex structure, and inability to guarantee the cleanliness of tribute silk cotton, etc. problems, to achieve the effect of saving resources, improving work efficiency and improving water recycling rate

Active Publication Date: 2020-07-31
杭州金利丝业有限公司
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to solve the above technical problems, the present invention provides a tribute silk cotton cleaning and flattening device to solve the existing tribute silk cotton cleaning and flattening device with complex structure, serious waste of water resources, too random collection after flattening, and it is impossible to guarantee the tribute silk cotton cleanliness problem

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of tribute silk cotton cleaning and flattening device
  • A kind of tribute silk cotton cleaning and flattening device
  • A kind of tribute silk cotton cleaning and flattening device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0027] as attached figure 1 to attach Figure 7 shown

[0028] The invention provides a cleaning and flattening device for tribute silk cotton, which includes a feeding wheel 1, a water tank device 2, a flushing mechanism 3, a gear transmission mechanism 4, a draining roller 5, a drying roller group 6, a steam generator 7, and a flattening mechanism 8 , the receiving wheel 9 and the guide rod mechanism 10, the feeding wheel 1 is connected with the gear transmission mechanism 4 through gear engagement; the water tank device 2 is arranged on the left side of the drying roller group 6; the flushing mechanism 3 is welded The mode is connected on the inner wall of the water tank device 2; the draining roller 5 adopts two, and is connected with the gear transmission mechanism 4 through gear meshing; the drying roller group 6 is made up of 5-8 drying rollers 61, and through The gear meshing is connected with the gear transmission mechanism 4; the steam generator 7 is arranged under...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a cleaning and flattening device for tribute silk wadding. The cleaning and flattening device comprises a feeding wheel, a sink device, a flushing mechanism, a gear transmissionmechanism, a draining roller, a drying roller set, a steam generator, a flattening mechanism, gathering wheels and a guiding rod, wherein the feeding wheel is connected with the gear transmission mechanism through gear engagement; the sink device is arranged on the left side of the drying roller set; the flushing mechanism is connected to the inner wall of the sink device in a welding mode. According to the arrangement of a lower guide rod mechanism, provided by the invention, a rolling shaft is driven by an electric motor to rotate; a Z-shaped groove on the rolling shaft drives a sliding block and distribution rods to do reciprocating motion; the flattened tribute silk wadding can be neatly stacked in a collection box, so that the cleanliness of the tribute silk wadding is ensured and labor force is reduced; due to the arrangement of the sink, the right oblique wall adopts a ladder shape with 45-degree tilt angle, so that flushed water favorably flows back into a sink; water is supplied by a water supply pipe through a self-priming pump, so that the cycle utilization rate of the water is improved, resources are saved and cost is reduced.

Description

technical field [0001] The invention belongs to the technical field of cleaning and flattening tribute silk cotton, in particular to a cleaning and flattening device for tribute silk cotton. Background technique [0002] With the development of society and the continuous improvement of human living standards, people have high requirements for food, clothing, housing and transportation, especially clothing has the greatest impact on people, and tribute silk cotton is also a part of clothing. At present, when cleaning tribute silk cotton, with The increase in cleaning quality leads to more and more wasted water and higher costs. At the same time, after the silk cotton is cleaned and dried, internal stress is easily generated inside the silk cotton, resulting in uneven surface of the silk cotton, which seriously affects the quality of the silk cotton. beautiful. [0003] The Chinese patent publication number is CN201720324347, and the name of the invention is a cleaning and fl...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): D06B1/02D06B15/00D06B17/02D06B23/20D06C15/00
CPCD06B1/02D06B15/00D06B17/02D06B23/20D06C15/00D06C2700/13
Inventor 徐金荣
Owner 杭州金利丝业有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products