Exhaust gas purification catalyst and method for producing the same
A technology of exhaust gas purification and catalyst, which is applied in the direction of catalyst activation/preparation, physical/chemical process catalyst, catalyst carrier, etc., can solve the problem of lack of exhaust gas purification performance, etc., and achieve the effect of excellent purification performance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0165] (1) Formation of the lower layer
[0166] Use 50g as CeO of the 1st CZ 2 :ZrO 2 = 35:65 (mass ratio), ceria-zirconia composite oxide with a secondary particle diameter of 1 μm, 50 g of CeO as the second CZ 2 :ZrO 2 =35:65 (weight ratio), ceria-zirconia composite oxide having a secondary particle diameter of 30 μm, 100 g of alumina, and 300 g of water were mixed to prepare a slurry for the lower layer.
[0167] This underlayer slurry was applied to a substrate, and heated at 250° C. for 1 hour to form a lower layer on the substrate (coating amount: 200 g / L).
[0168] (2) Formation of the upper layer
[0169] Use 50g of CeO as the upper layer with CZ 2 :ZrO 2 =20:80 (weight ratio), the ceria-zirconia composite oxide that the secondary particle diameter is 1 μ m is immersed in the aqueous solution that contains the rhodium nitrate of 0.2g / L equivalent, is then heated at 250 ℃ for 1 hour, and then heated at 500 ℃ for 1 hour to obtain Rh-loaded CZ.
[0170] 50 g of R...
Embodiment 2~16 and comparative example 6~12
[0209] (1) Preparation of catalyst
[0210] As the first CZ and the second CZ, CZ having the particle diameters described in Table 2 or Table 3 were used respectively, and the usage ratio of the two was set according to Table 2 or Table 3, and it was formed on the substrate in the same manner as in Example 1. Lower layer (coating amount: 200g / L).
[0211] Next, CZ carrying Rh was prepared in the same manner as in Example 1 except that CZ having the particle diameters described in Table 1 was used as CZ for the upper layer, and CZ carrying Rh was formed in the same manner as in Example 1 using this CZ carrying Rh. An upper layer (coating amount: 100 g / L) was formed on the base material of the lower layer, thereby preparing an exhaust gas purification catalyst.
[0212] (2) Evaluation
[0213] Using the exhaust gas purification catalyst prepared above, the measurement of the particle size of the oxide particles and the evaluation of the exhaust gas purification performance wer...
Embodiment 17
[0215] In this example, the effect of loading a small amount of Rh on the second CZ in the lower layer was investigated.
[0216] (1) Formation of the lower layer
[0217] As the 2nd CZ, use CeO 2 :ZrO 2 =35:65 (weight ratio), ceria-zirconia composite oxide with a secondary particle diameter of 30 μm, 50 g of the second CZ is immersed in an aqueous solution containing 0.25 g / L equivalent of rhodium nitrate, and then heated at 250° C. After 1 hour, further firing at 500° C. for 1 hour, the second CZ carrying Rh was obtained.
[0218] Use 50g as CeO of the 1st CZ 2 :ZrO 2 = 35:65 (weight ratio), ceria-zirconia composite oxide with a secondary particle diameter of 1 μm, 50 g of the above Rh-loaded 2nd CZ as the 2nd CZ, 50 g of alumina, and 200 g of water were mixed to prepare a slurry for the lower layer .
[0219] This underlayer slurry was applied to a substrate, and heated at 250° C. for 1 hour to form a lower layer on the substrate (coating amount: 150 g / L).
[0220] (...
PUM
Property | Measurement | Unit |
---|---|---|
particle size | aaaaa | aaaaa |
particle size | aaaaa | aaaaa |
particle diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com