Centralized liquid supply system of polishing machines

Abstract

The invention discloses a centralized liquid supply system of polishing machines. The centralized liquid supply system comprises a polishing liquid concentration part, a polishing liquid mixing part and a liquid supply and backflow pipeline. According to the centralized liquid supply system of the polishing machines, centralized liquid supply is carried out on various polishing machines through aliquid supply pool and a liquid supply pipe, and centralized management and operation of polishing liquid are facilitated. Only the concentration of the polishing liquid in the liquid supply pool needs to be detected every time, control over the concentrations of the polishing liquid of the polishing machines can be achieved, it is guaranteed that the concentrations of the polishing liquid of thepolishing machines is the same, and quality conditions have no large difference.

Description

technical field [0001] The invention relates to the technical field of polishing treatment, in particular to a centralized liquid supply system for a polishing machine. Background technique [0002] With the flattening and thinning of electronic products, and the acceleration of the upgrading of electronic products, the market demand for thinning liquid crystal panels is also increasing. The glass polishing machine is mainly used for single or double-sided grinding and polishing of liquid crystal glass substrates. It has the advantages of high processing precision and easy operation. It is one of the main equipment for thinning liquid crystal glass substrates. [0003] For the current mainstream glass polishing machine, the polishing liquid is supplied by an independent liquid supply method, that is, the polishing liquid in the mixing tank below is pumped to the polishing area through the liquid supply pump. With the use of polishing machines, the concentration of polishing...

AI Technical Summary

Problems solved by technology

With the use of polishing machines, the concentration of polishing liquid gradually decreases. It is necessary to arrange full-time personnel to detect the concentration of polishing machines one by one. For those whose concentration is lower than the process requirements, it is necessary to add high-concentration polishing liquid. These need to arrange full-time personnel to operate, which is time-consuming and laborious.

At the same time, the concentration of the polishing solution of each polishing machine is different, resulting in differences in the thickness of the polished glass substrate, which affects product quality

In addition, after the glass substrate is polished, water is required to wash the glass off the adsorption pad of the polishing machine, and the polishing powder on the polishing machine will be washed away, resulting in waste of polishing powder

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