Centralized liquid supply system of polishing machines

A polishing machine and polishing liquid technology, applied in the field of polishing treatment, can solve the problems of affecting product quality, time-consuming and laborious, polishing powder waste, etc., and achieve the effect of convenient centralized management and operation

Pending Publication Date: 2018-10-12
BENGBU GUOXIAN TECH CO LTD
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

With the use of polishing machines, the concentration of polishing liquid gradually decreases. It is necessary to arrange full-time personnel to detect the concentration of polishing machines one by one. For those whose concentration is lower than the process requirements, it is necessary to add high-concentration polishing liquid. These need to arrange full-time personnel to operate, which is time-consuming and laborious.
At the same time, the concentration of the polishing solution of each polishing machine is different, resulting in differences in the thickness of the polished glass substrate, which affects product quality
In addition, after the glass substrate is polished, water is required to wash the glass off the adsorption pad of the polishing machine, and the polishing powder on the polishing machine will be washed away, resulting in waste of polishing powder

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Centralized liquid supply system of polishing machines

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] refer to figure 1 , a centralized liquid supply system for a polishing machine proposed by the present invention includes: a polishing liquid concentration part, a polishing liquid preparation part, and a liquid supply and return pipeline.

[0020] The polishing solution concentration part includes a suction pump 1a, a concentration device 1b and a dope return pipe 1c. The polishing liquid preparation part includes a liquid supply tank 2a and a mixer 2b, and the return line includes a liquid supply pump 3a, a liquid supply pipe 3b and a thin liquid return pipe 3g.

[0021] The stirring blades of the stirrer 2b are inserted into the liquid supply pool 2a, so as to stir the polishing liquid stored in the liquid supply pool 2a, and prevent the polishing powder from settling. The liquid supply pool 2a is provided with a first outlet, a second outlet and a return port. The first outlet communicates with the first end of the liquid supply pipe 3b through the liquid supply p...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a centralized liquid supply system of polishing machines. The centralized liquid supply system comprises a polishing liquid concentration part, a polishing liquid mixing part and a liquid supply and backflow pipeline. According to the centralized liquid supply system of the polishing machines, centralized liquid supply is carried out on various polishing machines through aliquid supply pool and a liquid supply pipe, and centralized management and operation of polishing liquid are facilitated. Only the concentration of the polishing liquid in the liquid supply pool needs to be detected every time, control over the concentrations of the polishing liquid of the polishing machines can be achieved, it is guaranteed that the concentrations of the polishing liquid of thepolishing machines is the same, and quality conditions have no large difference.

Description

technical field [0001] The invention relates to the technical field of polishing treatment, in particular to a centralized liquid supply system for a polishing machine. Background technique [0002] With the flattening and thinning of electronic products, and the acceleration of the upgrading of electronic products, the market demand for thinning liquid crystal panels is also increasing. The glass polishing machine is mainly used for single or double-sided grinding and polishing of liquid crystal glass substrates. It has the advantages of high processing precision and easy operation. It is one of the main equipment for thinning liquid crystal glass substrates. [0003] For the current mainstream glass polishing machine, the polishing liquid is supplied by an independent liquid supply method, that is, the polishing liquid in the mixing tank below is pumped to the polishing area through the liquid supply pump. With the use of polishing machines, the concentration of polishing...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B24B57/02
CPCB24B57/02
Inventor 杨金发谢加加唐寿武李洪福王德柱年士旺
Owner BENGBU GUOXIAN TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap